scholarly journals Super-Resolution Defect Characterization Using Microwave Near-Field Resonance Reflectometry and Cross-correlation Image Processing

2017 ◽  
Vol 18 (1) ◽  
Author(s):  
Oleksandr Malyuskin ◽  
Vincent Fusco
Nanophotonics ◽  
2020 ◽  
Vol 0 (0) ◽  
Author(s):  
Ruslan Röhrich ◽  
A. Femius Koenderink

AbstractStructured illumination microscopy (SIM) is a well-established fluorescence imaging technique, which can increase spatial resolution by up to a factor of two. This article reports on a new way to extend the capabilities of structured illumination microscopy, by combining ideas from the fields of illumination engineering and nanophotonics. In this technique, plasmonic arrays of hexagonal symmetry are illuminated by two obliquely incident beams originating from a single laser. The resulting interference between the light grating and plasmonic grating creates a wide range of spatial frequencies above the microscope passband, while still preserving the spatial frequencies of regular SIM. To systematically investigate this technique and to contrast it with regular SIM and localized plasmon SIM, we implement a rigorous simulation procedure, which simulates the near-field illumination of the plasmonic grating and uses it in the subsequent forward imaging model. The inverse problem, of obtaining a super-resolution (SR) image from multiple low-resolution images, is solved using a numerical reconstruction algorithm while the obtained resolution is quantitatively assessed. The results point at the possibility of resolution enhancements beyond regular SIM, which rapidly vanishes with the height above the grating. In an initial experimental realization, the existence of the expected spatial frequencies is shown and the performance of compatible reconstruction approaches is compared. Finally, we discuss the obstacles of experimental implementations that would need to be overcome for artifact-free SR imaging.


2006 ◽  
Vol 06 (01) ◽  
pp. L1-L6
Author(s):  
JONG U. KIM ◽  
LASZLO B. KISH

We propose a new cross-correlation method that can recognize independent realizations of the same type of stochastic processes and can be used as a new kind of pattern recognition tool in biometrics, sensing, forensic, security and image processing applications. The method, which we call bispectrum correlation coefficient method, makes use of the cross-correlation of the bispectra. Three kinds of cross-correlation coefficients are introduced. To demonstrate the new method, six different random telegraph signals are tested, where four of them have the same power density spectrum. It is shown that the three coefficients can map the different stochastic processes to specific sub-volumes in a cube.


2001 ◽  
Vol 40 (Part 1, No. 6A) ◽  
pp. 4101-4102 ◽  
Author(s):  
Fu Han Ho ◽  
Wei Yi Lin ◽  
Hsun Hao Chang ◽  
Yu Hsaun Lin ◽  
Wei-Chih Liu ◽  
...  

Author(s):  
Yizhao Guan ◽  
Hiromasa Kume ◽  
Shotaro Kadoya ◽  
Masaki Michihata ◽  
Satoru Takahashi

Abstract Microstructures are widely used in the manufacture of functional surfaces. An optical-based super-resolution, non-invasive method is preferred for the inspection of surfaces with massive microstructures. The Structured Illumination Microscopy (SIM) uses standing-wave illumination to reach optical super-resolution. Recently, coherent SIM is being studied. It can obtain not only the super-resolved intensity distribution but also the phase and amplitude distribution of the sample surface beyond the diffraction limit. By analysis of the phase-depth dependency, the depth measurement for microgroove structures with coherent SIM is expected. FDTD analysis is applied for observing the near-field response of microgroove under the standing-wave illumination. The near-field phase shows depth dependency in this analysis. Moreover, the effects from microgroove width, the incident angle, and the relative position between the standing-wave peak and center of the microgroove are investigated. It is found the near-field phase change can measure depth until 200 nm (aspect ratio 1) with an error of up to 20.4 nm in the case that the microgroove width is smaller than half of the wavelength.


2007 ◽  
Vol 46 (6B) ◽  
pp. 3898-3901 ◽  
Author(s):  
Kazuma Kurihara ◽  
Yuzo Yamakawa ◽  
Takayuki Shima ◽  
Junji Tominaga

2016 ◽  
Vol 55 (9S) ◽  
pp. 09SB01
Author(s):  
Shota Hosogai ◽  
Tsutomu Ansai ◽  
Takehisa Yoshinari ◽  
Takaya Tanabe

2018 ◽  
Vol 53 (12) ◽  
pp. 3599-3612 ◽  
Author(s):  
Philipp Hillger ◽  
Ritesh Jain ◽  
Janusz Grzyb ◽  
Wolfgang Forster ◽  
Bernd Heinemann ◽  
...  

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