Structure and properties of TiB2 thin films deposited at low temperatures using RF magnetron sputtering

2008 ◽  
Vol 23 (5) ◽  
pp. 666-669 ◽  
Author(s):  
Wei Dai ◽  
Tongjun Zhang ◽  
Junyou Yang ◽  
Rongxing Sun ◽  
Juliang Xu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Low Temperatures ◽  
Rf Magnetron Sputtering ◽  
Structure And Properties

Thickness effect on structure and properties of ZAO thin films by RF magnetron sputtering at different substrate temperatures

2011 ◽  
Vol 43 (9) ◽  
pp. 1738-1745 ◽  
Author(s):  
B.L. Zhu ◽  
S.J. Zhu ◽  
J. Wang ◽  
J. Wu ◽  
D.W. Zeng ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Thickness Effect ◽  
Structure And Properties ◽  
Substrate Temperatures

Structural transition of ZnO thin films produced by RF magnetron sputtering at low temperatures

2013 ◽  
Vol 24 (9) ◽  
pp. 3143-3148 ◽  
Author(s):  
A. M. Rosa ◽  
E. P. da Silva ◽  
M. Chaves ◽  
L. D. Trino ◽  
P. N. Lisboa-Filho ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Low Temperatures ◽  
Structural Transition ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Films

Effect of Nitrogen Flow Rate on the Structure and Properties of TiN Thin Films Deposited onto β-Type Ti-15Mo-3Nb-3Al-0.2Si Alloy Substrates by Reactive Magnetron Sputtering

2012 ◽  
Vol 557-559 ◽  
pp. 1998-2001 ◽  
Author(s):  
Jun Hee Lee ◽  
A. Joseph Nathanael ◽  
Sun Ig Hong
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Nitrogen Concentration ◽  
Rf Magnetron Sputtering ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
Nitrogen Flow Rate ◽  
Average Roughness ◽  
Tin Thin Films

Titanium Nitride (TiN) thin film was deposited on β-type Ti-15Mo-3Nb-3Al-0.2Si alloy plates by RF magnetron sputtering method. The effect of nitrogen flow rate on the structure and properties of the TiN thin films were studied. The preferred orientation of TiN thin films changed from (111) to (200) as the nitrogen flow rate increased due to the effect of the kinetic energy of the bombarding particles. The coating thickness was found to decrease with increasing nitrogen concentration, which also favors (200) orientation with increasing nitrogen flow rate. With increase of nitrogen flow, the morphology of the TiN thin films films changed from characteristic pyramidal shaped grains to columnar-shaped grains. The roughness analysis of the coating shows that the average roughness of the coating decreased with increasing nitrogen flow rate. The increase of hardness with increasing nitrogen flow rate is attributed to the decrease in grain size.

Properties of barium titanate (BaTiO 3 ) thin films grown on silicon by rf magnetron sputtering

2000 ◽  
Vol 80 (3) ◽  
pp. 395-407 ◽  
Author(s):  
E. K. Evangelou, N. Konofaos, C. B. Th
Keyword(s):  
Thin Films ◽  
Barium Titanate ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering

Single Crystal, High Band Gap CdS Thin Films Grown by RF Magnetron Sputtering in Argon Atmosphere for Solar Cell Applications

2018 ◽  
Vol 10 (3) ◽  
pp. 03005-1-03005-6 ◽  
Author(s):  
Rupali Kulkarni ◽  
◽  
Amit Pawbake ◽  
Ravindra Waykar ◽  
Ashok Jadhawar ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cell ◽  
Magnetron Sputtering ◽  
Single Crystal ◽  
Band Gap ◽  
Rf Magnetron Sputtering ◽  
Argon Atmosphere ◽  
Cds Thin Films ◽  
High Band
Sign in / Sign up

Export Citation Format

Share Document