Robust Mechanical Properties of Electrically Insulative Alumina Films by Supersonic Aerosol Deposition

2015 ◽  
Vol 24 (6) ◽  
pp. 1046-1051 ◽  
Author(s):  
Jong-Gun Lee ◽  
You-Hong Cha ◽  
Do-Yeon Kim ◽  
Jong-Hyuk Lee ◽  
Tae-Kyu Lee ◽  
...  
2003 ◽  
Vol 173 (2-3) ◽  
pp. 293-298 ◽  
Author(s):  
G. Alcalá ◽  
S. Mato ◽  
P. Skeldon ◽  
G.E. Thompson ◽  
A.B. Mann ◽  
...  

2012 ◽  
Vol 7 (1) ◽  
pp. 261 ◽  
Author(s):  
Oh-Yun Kwon ◽  
Hyun-Jun Na ◽  
Hyung-Jun Kim ◽  
Dong-Won Lee ◽  
Song-Min Nam

2012 ◽  
Vol 2012 (CICMT) ◽  
pp. 000406-000410
Author(s):  
Hiroki TSUDA ◽  
Jun AKEDO ◽  
Shingo HIROSE ◽  
Keishi OHASHI

The possibility and mechanical improvement of the infrared ceramic coatings fabricated on fluoride substrates at room temperature by aerosol deposition (AD) were investigated aiming to optical components for infrared applications and devices. The yttria coating possibility fabricated on barium fluoride substrates by the AD process was found by adjusting one of the deposition conditions. The optical and mechanical properties of the fabricated ceramic coatings, which are important in practical applications, were evaluated by transmittance and hardness measurements respectively. The mechanical hardness of the fabricated yttria single coatings was increased to 4 times higher than that of the barium fluoride substrates. Furthermore, by an additional layer on a barium fluoride substrate, the mechanical properties of the fabricated multi-coatings including an upper yttria layer were improved from that of the single yttria coating on the barium fluoride substrate, retaining the IR transmittance of the single yttria coating at the wavelength of 10μm.


1993 ◽  
Vol 308 ◽  
Author(s):  
C. A. Ross ◽  
J. J. Barrese

ABSTRACTThick r.f.-sputtered alumina is used as an overcoat material in microelectronic applications. The stress in the material is compressive and its magnitude is influenced by the sputtering conditions including the power, gas pressure and r.f. substrate bias. These parameters also affect the deposition rate, stoichiometry and sputter gas (argon) content of the material and its etch rate in hydroxide solutions. Nanoindentation measurements of the elastic modulus and hardness are presented for alumina sputtered under different bias conditions and show that the zero bias material appears to be harder and suffer than material deposited at -100V bias.


2013 ◽  
Vol 200 ◽  
pp. 54-59
Author(s):  
Eugene Ignashev ◽  
Vladimir Shulgov

The flexural strength and microhardness of free-standing anodic alumina films obtained from the one-sided anodization of aluminum are discussed. The films formed of high-pure aluminum were shown to have maximum flexural strength. Even a small amount of impurities decreases the flexural strength of the resulting free-standing anodic alumina films to be associated with their higher defectiveness. The microhardness of thick films of anodic alumina measured on the side of a barrier layer is independent of the film thickness, and this measured on the side of the porous layer decreases continuosly from 5.39-5.88 GPa to 2.94 GPa when the film thickness increases from 50 to 500 μm. The microhardness of thin (<100 μm) films of porous anodic alumina was studied as well. When the samples were immovable in the electrolyte during the anodization, the microhardness of the resulting films is low and varies from 0.93 to 1.86 GPa. When the samples moved in the electrolyte occasionally during the anodization, the microhardness of the resulting films increases to 1.67 – 2.45 GPa. When the samples moved in the electrolyte continuously during the anodization, the microhardness of the resulting films increases to 2.45 - 3.43 GPa. This is associated with the rate of the heat removal from the sample (the oxidation rate) during the anodization. The microhardness of the free-standing porous anodic alumina films formed of low binary alloys of aluminum is lower than one of films formed of high-pure aluminum.


2005 ◽  
Vol 40 (24) ◽  
pp. 6345-6355 ◽  
Author(s):  
M. P. Hughey ◽  
R. F. Cook ◽  
J. Thurn

1995 ◽  
Vol 254 (1-2) ◽  
pp. 153-163 ◽  
Author(s):  
V.A.C. Haanappel ◽  
D.v.d. Vendel ◽  
H.S.C. Metselaar ◽  
H.D. van Corbach ◽  
T. Fransen ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document