Optimization of GaAs-based 940 nm infrared light emitting diode with dual-junction design

2019 ◽  
Vol 15 (2) ◽  
pp. 113-116 ◽  
Author(s):  
Hong-liang Lin ◽  
Xiang-hua Zeng ◽  
Shi-man Shi ◽  
Hai-jun Tian ◽  
Mo Yang ◽  
...  
2021 ◽  
pp. 103879
Author(s):  
Hyung-Joo Lee ◽  
Gwang-Hoon Park ◽  
Jin-Su So ◽  
Choong-Hun Lee ◽  
Jae-Hoon Kim ◽  
...  

2010 ◽  
Vol 173 ◽  
pp. 1-6 ◽  
Author(s):  
Haider F. Abdul Amir ◽  
Fuei Pien Chee

In this research, optoelectronic devices consisted of an infrared light emitting diode and a phototransistor with no special handling or third party-packaging were irradiated to ionizing radiation utilizing x-rays. It was found that the devices under test (DUTs) undergo performance degradation in their functional parameters during exposure to x-rays. These damaging effects are depending on their current drives and also the Total Ionizing Dose (TID) absorbed. The TID effects by x-rays are cumulative and gradually take place throughout the lifecycle of the devices exposed to radiation.


2016 ◽  
Vol 34 (12) ◽  
pp. 610-626 ◽  
Author(s):  
Margaret A. Naeser ◽  
Paula I. Martin ◽  
Michael D. Ho ◽  
Maxine H. Krengel ◽  
Yelena Bogdanova ◽  
...  

2019 ◽  
Vol 19 (10) ◽  
pp. 6187-6191 ◽  
Author(s):  
Seung Ho Lee ◽  
Min Seok Kim ◽  
Ok-Kyun Kim ◽  
Hyung-Hwan Baik ◽  
Ji-Hye Kim

2007 ◽  
Vol 121-123 ◽  
pp. 557-560 ◽  
Author(s):  
J. Xu ◽  
Katsunori Makihara ◽  
Hidenori Deki ◽  
Yoshihiro Kawaguchi ◽  
Hideki Murakami ◽  
...  

Light emitting diode with MOS structures containing multiple-stacked Si quantum dots (QDs)/SiO2 was fabricated and the visible-infrared light emission was observed a room temperature when the negative gate bias exceeded the threshold voltage. The luminescence intensity was increased linearly with increasing the injected current density. The possible luminescence mechanism was briefly discussed and the delta P doping was performed to obtain the doped Si QDs and the improvement of EL intensity was demonstrated.


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