Thin films of metal oxides on silicon by chemical vapor deposition with organometallic compounds. I
1972 ◽
Vol 17
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pp. 298-301
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1998 ◽
Vol 282-283
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pp. 123-130
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1974 ◽
Vol 24-25
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pp. 172-174
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2010 ◽
Vol 25
(7)
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pp. 748-752
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2009 ◽
Vol 23
(09)
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pp. 2159-2165
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2017 ◽
Vol 19
(8)
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pp. 1700193
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Keyword(s):