Plasma characterization of a high-pressure d(-Sputtering system used for the “in situ” preparation of high-Tc superconducting thin films

1994 ◽  
Vol 90 (9) ◽  
pp. 539-542 ◽  
Author(s):  
D. Giratá ◽  
Y. Rojas ◽  
E. Bacca ◽  
M. Chacón ◽  
W. Lopera ◽  
...  
Keyword(s):  
Thin Films ◽  
High Pressure ◽  
Superconducting Thin Films ◽  
High Tc ◽  
In Situ Preparation ◽  
Plasma Characterization ◽  
Sputtering System

In-Situ Preparation and Characterization of Superconducting Thin Films and Related Materials by Mocvd for the Development of Three Terminal Switching Devices

1989 ◽  
Vol 169 ◽  
Author(s):  
R. Singh ◽  
S. Sinha ◽  
J. Narayan
Keyword(s):  
Thin Films ◽  
High Temperature Superconductor ◽  
Chemical Vapor ◽  
Silicon Substrates ◽  
Superconducting Thin Films ◽  
In Situ Preparation ◽  
In Situ Deposition ◽  
Rapid Isothermal Processing

AbstractMetalorganic chemical vapor deposition (MOCVD) has the potential of emerging as a major technique for the fabrication of high temperature superconductor devices. In this paper, we present preliminary results of in-situ deposition of Y-Ba-Cu-0 thin films (Tc = 79K) by rapid isothermal processing assisted MOCVD on BaF2/silicon substrates.

IN-SITU PREPARATION OF YBa2Cu3O7 SUPERCONDUCTING THIN FILMS BY PULSED Nd:YAG LASER DEPOSITION

1992 ◽  
Vol 06 (08) ◽  
pp. 477-483 ◽  
Author(s):  
QINGXIN SU ◽  
SHIFA XU ◽  
DAFU CUI ◽  
HUIBIN LU ◽  
YONGJUN TIAN ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Nd:Yag Laser ◽  
Ac Susceptibility ◽  
Substrate Surface ◽  
Zero Magnetic Field ◽  
Superconducting Thin Films ◽  
In Situ Preparation ◽  
Zero Resistance

High-T c superconducting thin films of YBa 2 Cu 3 O 7 were grown in-situ on (100) SrTiO 3 substrates by Nedymium:yttrium aluminum garnet [Nd:YAG] laser ablation. The effects of the substrate temperature on the transition temperature, microcrystalline structure and surface morphology of the films were discussed. Best results were obtained in the 730°–770°C range. X-ray diffraction analysis showed that these films were highly c-oriented with the c-axis perpendicular to the substrate surface. At the optimum substrate temperature, a very smooth morphology with only a few small particles were observed by scanning electron microscopy. The zero resistance temperature of these films were ≥ 90 K with a narrow transition width and the ac susceptibility measurement also gave the same result. The highest critical current density obtained at 77 K and zero magnetic field was 3.8 × 106 A/cm 2.

In-Situ Preparation of Y-Ba-Cu-O Thin Films Using Mass-Spectrometer Rate Control and Atomic Oxygen

1992 ◽  
Vol 275 ◽  
Author(s):  
H. Ohlsén ◽  
M. Ottosson ◽  
J. Hudner ◽  
M. ÖStling ◽  
L. Stolt ◽  
...  
Keyword(s):  
Thin Films ◽  
Mass Spectrometer ◽  
Rate Control ◽  
Atomic Oxygen ◽  
Film Structure ◽  
Rocking Curve ◽  
In Situ Preparation ◽  
Layer Structures

ABSTRACTThin films of YBCO were prepared using a mass-spectrometer controlled coevapora-tion/MBE process with atomic oxygen. Under the conditions of low pressure, necessary for mass-spectrometer rate control, it is shown that an atomic oxygen beam source can be utilized in order to grow high quality thin films of YBCO as well as multi-layer structures involving YBCO and Y2O3. Values of Tc = 88.5 K and Jc = 6–106 A/cm2 at 77 K were determined for a strip with a width of 10 μm of YBCO deposited on a LaAlO3 substrate. Film structure is analyzed by XRD and rocking curve measurements. Magnetic characterization of films and multi-layer structures are reported.

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