Kinematic theory of the effect of surface relaxation on X-ray diffraction peak shifts

1973 ◽  
Vol 38 (2) ◽  
pp. 357-372 ◽  
Author(s):  
Ralph T.S. Shiah ◽  
R.W. Vook
Keyword(s):  
Diffraction Peak ◽  
Surface Relaxation ◽  
X Ray Diffraction ◽  
X Ray ◽  
Kinematic Theory ◽  
Effect Of Surface

Problems Associated with Kα Doublet in Residual Stress Measurements

1979 ◽  
Vol 23 ◽  
pp. 333-339
Author(s):  
S. K. Gupta ◽  
B. D. Cullity
Keyword(s):  
Residual Stress ◽  
Silicon Powder ◽  
Lattice Parameter ◽  
Diffraction Peak ◽  
Parameter Determination ◽  
X Ray Diffraction ◽  
X Ray ◽  
Analysis Techniques ◽  
The Difference ◽  
Similar Accuracy

Since the measurement of residual stress by X-ray diffraction techniques is dependent on the difference in angle of a diffraction peak maximum when the sample is examined consecutively with its surface at two different angles to the diffracting planes, it is important that these diffraction angles be obtained precisely, preferably with an accuracy of ± 0.01 deg. 2θ. Similar accuracy is desired in precise lattice parameter determination. In such measurements, it is imperative that the diffractometer be well-aligned. It is in the context of diffractometer alignment with the aid of a silicon powder standard free of residual stress that the diffraction peak analysis techniques described here have been developed, preparatory to residual stress determinations.

Role of water in the surface relaxation of the fluorapatite (100) surface by grazing incidence x-ray diffraction

2007 ◽  
Vol 75 (3) ◽  
Author(s):  
Aparna Pareek ◽  
Xavier Torrelles ◽  
Jordi Rius ◽  
Uta Magdans ◽  
Hermann Gies
Keyword(s):  
Grazing Incidence ◽  
Surface Relaxation ◽  
X Ray Diffraction ◽  
X Ray

Transparent Conductive Cu-In-O Thin Films Deposited by Reactive DC Magnetron Sputtering with Different Targets

2011 ◽  
Vol 239-242 ◽  
pp. 2752-2755
Author(s):  
Fan Ye ◽  
Xing Min Cai ◽  
Fu Ping Dai ◽  
Dong Ping Zhang ◽  
Ping Fan ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Optical Band Gap ◽  
Diffraction Peak ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Flow Rates ◽  
X Ray ◽  
Equal Distance ◽  
Transmittance Curve

Transparent conductive Cu-In-O thin films were deposited by reactive DC magnetron sputtering. Two types of targets were used. The first was In target covered with a fan-shaped Cu plate of the same radius and the second was Cu target on which six In grains of 1.5mm was placed with equal distance between each other. The samples were characterized with scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), UV/VIS spectrophotometer, four-probe measurement etc. SEM shows that the surfaces of all the samples are very smooth. EDX shows that the samples contain Cu, In as well as O, and different targets result in different atomic ratios of Cu to In. A diffraction peak related to rhombohedra-centered In2O3(012) is observed in the XRD spectra of all the samples. For both the two targets, the transmittance decreases with the increase of O2flow rates. The direct optical band gap of all the samples is also estimated according to the transmittance curve. For both the two targets, different O2flow rates result in different sheet resistances and conductivities. The target of Cu on In shows more controllability in the composition and properties of Cu-In-O films.

Crystallite size and lattice strain of lithiated spinel material for rechargeable battery by X-ray diffraction peak-broadening analysis

2019 ◽  
Vol 43 (5) ◽  
pp. 1903-1911 ◽  
Author(s):  
Ahmed A. Al-Tabbakh ◽  
Nilgun Karatepe ◽  
Aseel B. Al-Zubaidi ◽  
Aida Benchaabane ◽  
Natheer B. Mahmood
Keyword(s):  
Crystallite Size ◽  
Lattice Strain ◽  
Diffraction Peak ◽  
Rechargeable Battery ◽  
X Ray Diffraction ◽  
X Ray ◽  
Peak Broadening

Effect of Sputtering Pressure on the Formation of Semiconducting Mg2Si Films

2010 ◽  
Vol 663-665 ◽  
pp. 166-169
Author(s):  
Qing Quan Xiao ◽  
Quan Xie ◽  
Ke Jie Zhao ◽  
Zhi Qiang Yu
Keyword(s):  
Film Growth ◽  
Diffraction Peak ◽  
Morphological Properties ◽  
X Ray Diffraction ◽  
X Ray ◽  
Peak Intensity ◽  
Main Diffraction Peak ◽  
Diffraction Peaks ◽  
Si Films ◽  
Sputtering Pressure

Semiconducting Mg2Si films were fabricated on Si (111) substrates by magnetron sputtering and subsequent annealing, and the effects of sputtering pressure on the Mg2Si film growth were studied. The structural and morphological properties of Mg2Si films were investigated by the means of X-ray diffraction (XRD) and scanning electron microscopy (SEM). The results showed that the Mg2Si (220) main diffraction peak intensity increased and then decreased with the increasing of sputtering pressure. The (220) diffraction peak got its maximum at 3.0 Pa sputtering pressure. The intensity of Mg2Si (200) and (400) diffraction peaks increased rapidly as the sputtering pressure decreased when the pressure was lower than 1.5 Pa. The films prepared at higher sputtering pressure had very irregular microstructures, and the surface of semiconducting Mg2Si films became smoother with the decreasing of the sputtering pressure.

Microbeam X-ray diffraction from twisted lamellar crystals: theory and computer simulation

2009 ◽  
Vol 42 (4) ◽  
pp. 673-680 ◽  
Author(s):  
Valeriy A. Luchnikov ◽  
Dimitri A. Ivanov
Keyword(s):  
Basal Plane ◽  
Peak Position ◽  
Diffraction Peak ◽  
Reciprocal Space ◽  
X Ray Diffraction ◽  
X Ray ◽  
Peak Broadening ◽  
Asymmetric Shape ◽  
Diffraction Peaks ◽  
Lamellar Crystals

The diffraction peak position, width and intensity distribution are calculated for the case of a helicoidally twisted crystalline lamella, both analytically and numerically. It is shown that the diffraction peak broadening depends on the orientation of the corresponding reciprocal-space vector with respect to the helicoid axis and the normal to the lamellar basal plane. The equatorial peaks, which are close to the normal direction to the lamellar basal plane, are characterized by the highest azimuthal width. By contrast, the reflections positioned close to the lamellar surface have the smallest azimuthal width. For non-equatorial peaks in the proximity of the twisting axis the intensity has an unusual asymmetric shape. The shape of the microbeam, as well as its position and direction with respect to the lamella, influences the shape of the diffraction peaks in reciprocal space and their appearance in two-dimensional diffractograms. The proposed approach can be useful, for example, for the interpretation of microbeam diffractograms of banded polymer spherulites.

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