The effects of zinc diffusion on the electrical and optical properties of ZnO:Al films prepared by r.f. reactive sputtering

1991 ◽  
Vol 199 (2) ◽  
pp. 223-230 ◽  
Author(s):  
Yasuhiro Igasaki ◽  
Hiromi Saito
1985 ◽  
Vol 11 (4) ◽  
pp. 271-280 ◽  
Author(s):  
Grazyna Beensh-Marchwicka ◽  
Lubomila Krol-Stepniewska

The preparation of tin dioxide films by low energy reactive sputtering of tin and tin-antimony (1-10% wt. Sb) in an oxygen – argon atmosphere is described. The dependences of oxygen content in the range from 0 to 50%, target compositions, substrate temperature of 300 K-573 K on minimum resistivity at satisfactory transmittance and on reproducibility are discussed. The correlation between the electrical and optical properties and the microstructure of the films is shown.


2021 ◽  
Vol 60 (3) ◽  
pp. 035503
Author(s):  
Takeru Okada ◽  
Chisato Tateyama ◽  
Kotaro Hoshino ◽  
Tomoyuki Kawashima ◽  
Katsuyoshi Washio

Sign in / Sign up

Export Citation Format

Share Document