Compositional and structural analysis of aluminum oxide films prepared by plasma-enhanced chemical vapor deposition

1994 ◽  
Vol 237 (1-2) ◽  
pp. 57-65 ◽  
Author(s):  
Yong-Chun Kim ◽  
Hyung-Ho Park ◽  
John S. Chun ◽  
Won-Jong Lee
Keyword(s):  
Chemical Vapor Deposition ◽  
Structural Analysis ◽  
Aluminum Oxide ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor

Effect of water vapor on the growth of aluminum oxide films by low pressure chemical vapor deposition

1993 ◽  
Vol 230 (2) ◽  
pp. 156-159 ◽  
Author(s):  
J.S. Kim ◽  
H.A. Marzouk ◽  
P.J. Reucroft ◽  
J.D. Robertson ◽  
C.E. Hamrin
Keyword(s):  
Chemical Vapor Deposition ◽  
Water Vapor ◽  
Aluminum Oxide ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Effect Of Water ◽  
Pressure Chemical

Passivation properties of aluminum oxide films deposited by mist chemical vapor deposition for solar cell applications

2015 ◽  
Vol 54 (8S1) ◽  
pp. 08KD25 ◽  
Author(s):  
Shohei Miki ◽  
Koji Iguchi ◽  
Sho Kitano ◽  
Koki Hayakashi ◽  
Yasushi Hotta ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Aluminum Oxide ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor

NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

1993 ◽  
Vol 32 (Part 2, No. 10A) ◽  
pp. L1448-L1450 ◽  
Author(s):  
Eiji Fujii ◽  
Atsushi Tomozawa ◽  
Satoru Fujii ◽  
Hideo Torii ◽  
Masumi Hattori ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Metalorganic Chemical
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