A luminescence study of the interface quality of GaInAs/InP single quantum wells grown by metalorganic vapour phase epitaxy

1991 ◽  
Vol 9 (1) ◽  
pp. 99-102 ◽  
Author(s):  
S. Nilsson ◽  
A. Gustafsson ◽  
X. Liu ◽  
L. Samuelson ◽  
M.-E. Pistol ◽  
...  
Author(s):  
A. Carlsson ◽  
J.-O. Malm ◽  
A. Gustafsson

In this study a quantum well/quantum wire (QW/QWR) structure grown on a grating of V-grooves has been characterized by a technique related to chemical lattice imaging. This technique makes it possible to extract quantitative information from high resolution images.The QW/QWR structure was grown on a GaAs substrate patterned with a grating of V-grooves. The growth rate was approximately three monolayers per second without growth interruption at the interfaces. On this substrate a barrier of nominally Al0.35 Ga0.65 As was deposited to a thickness of approximately 300 nm using metalorganic vapour phase epitaxy . On top of the Al0.35Ga0.65As barrier a 3.5 nm GaAs quantum well was deposited and to conclude the structure an additional approximate 300 nm Al0.35Ga0.65 As was deposited. The GaAs QW deposited in this manner turns out to be significantly thicker at the bottom of the grooves giving a QWR running along the grooves. During the growth of the barriers an approximately 30 nm wide Ga-rich region is formed at the bottom of the grooves giving a Ga-rich stripe extending from the bottom of each groove to the surface.


2000 ◽  
Vol 618 ◽  
Author(s):  
U. Pietsch ◽  
U. Zeimer ◽  
L. Hofmann ◽  
J. Grenzer ◽  
S. Gramlich

ABSTRACTStrain and compositional modulation in AlxGa1−xAs layers grown by metalorganic vapour phase epitaxy (MOVPE) over a sinusoidally shaped GaAs (001) surface grating were studied by scanning electron microscopy (SEM), X-ray grazing-incidence diffraction (GID) and photoluminescence (PL). Two growth temperatures and two compositions were chosen to realize planar overlayers. By SEM a periodic reduction in Al-content was found at the valley positions of the GaAs grating. The appearance of such vertical quantum wells (VQWs) has been explained by the growth rate anisotropy between high-index and (001) planes and a curvature-induced capillarity flow of Ga. Estimated from PL energies a larger reduction of the Al-concentration in the VQW and also at the high-index sidewall facets was found than compared to predictions from the capillarity flow theory. Using depth-resolved GID we show that the formation of VQWs is accompanied by a periodic lateral strain field. Therefore we assume, that the formation of the VQWs is influenced by strain induced diffusion due to the interaction of opposite sidewall facets.


2001 ◽  
Vol 19 (1) ◽  
pp. 131-133 ◽  
Author(s):  
Lü You-Ming ◽  
Shen De-Zhen ◽  
Liu Yi-Chun ◽  
Li Bing-Hui ◽  
Zhang Ji-Ying ◽  
...  

1994 ◽  
Vol 340 ◽  
Author(s):  
P. Bigenwald ◽  
O. Laire ◽  
X. Zhang ◽  
O. Briot ◽  
B. Gil ◽  
...  

ABSTRACTWe study the optical properties of metalorganic vapour phase epitaxy (MOVPE) grown (Ga,In)As-GaAs single quantum wells as a function of the growth parameters. Our objective is to study the properties of the type II light-hole excitons with light-hole wave function delocalized in the thick GaAs layers and electrons confined in the ternary alloy. However, marked structures (like for type I excitons) are observed in the reflectivity spectra. This we interpret in the context of a novel approach of the exciton problem via a self-consistent calculation of the electron-hole interaction.


2009 ◽  
Vol 615-617 ◽  
pp. 939-942
Author(s):  
Piotr Caban ◽  
Kinga Kościewicz ◽  
Wlodek Strupiński ◽  
Jan Szmidt ◽  
Karolina Pagowska ◽  
...  

The influence of surface preparation of 4H-SiC substrates on structural properties of GaN grown by low pressure metalorganic vapour phase epitaxy was studied. Substrate etching has an impact on the crystallographic structure of epilayers and improves its crystal quality. The GaN layers were characterized by RBS/channelling and HRXRD measurements. It was observed that on-axis 4H-SiC is most suitable for GaN epitaxy and that substrate etching improves the crystal quality of epilayer.


2014 ◽  
Vol 65 (5) ◽  
pp. 299-303 ◽  
Author(s):  
Damian Pucicki ◽  
Katarzyna Bielak ◽  
Beata Ściana ◽  
Wojciech Dawidowski ◽  
Karolina Żelazna ◽  
...  

Abstract GaInNAs alloys are mostly used as an active part of light sources for long wavelength telecom applications. Beside this, these materials are used as thin quantum wells (QWs), and a need is to grow thick layers of such semiconductor alloys for photodetectors and photovoltaic cells applications. However, structural characterization of the GaInNAs layers is hindered by non-homogeneity of the In and N distributions along the layer. In this work the challenges of the structural characterization of doped thick GaInNAs layers grown by atmospheric pressure metalorganic vapour phase epitaxy (APMOVPE) will be presented


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