Structural properties of the titanium dioxide thin films grown by atomic layer deposition at various numbers of reaction cycles

2010 ◽  
Vol 257 (1) ◽  
pp. 186-191 ◽  
Author(s):  
A.P. Alekhin ◽  
S.A. Gudkova ◽  
A.M. Markeev ◽  
A.S. Mitiaev ◽  
A.A. Sigarev ◽  
...  
2009 ◽  
Vol 113 (52) ◽  
pp. 21825-21830 ◽  
Author(s):  
Martin Rose ◽  
Jaakko Niinistö ◽  
Pawel Michalowski ◽  
Lukas Gerlich ◽  
Lutz Wilde ◽  
...  

2017 ◽  
Vol 32 (9) ◽  
pp. 093005 ◽  
Author(s):  
Janne-Petteri Niemelä ◽  
Giovanni Marin ◽  
Maarit Karppinen

2008 ◽  
Vol 8 (9) ◽  
pp. 4726-4729 ◽  
Author(s):  
Woong-Sun Kim ◽  
Myoung-Gyun Ko ◽  
Tae-Sub Kim ◽  
Sang-Kyun Park ◽  
Yeon-Keon Moon ◽  
...  

Plasma enhanced atomic layer deposition (PEALD) of titanium dioxide thin films was conducted using Tetrakis dimethylamino titanium (TDMATi) and an oxygen plasma on a polyethersulfon (PES) substrate at a deposition temperature of 90 °C. The effects of the induced plasma power on passivation properties were investigated according to film thickness. The growth rate of the titanium dioxide film was 0.8 Å/cycle, and the water vapor transmission rate (WTVR) for a 80 nm titanium dioxide film was 0.023 g/m2·day. The passivation performance of the titanium dioxide film was investigated using an organic light-emitting diode (OLED). The coated OLED lifetime was 90 h, 15 times longer than that of an uncoated sample.


2012 ◽  
Vol 258 (8) ◽  
pp. 3415-3419 ◽  
Author(s):  
I.P. Grigal ◽  
A.M. Markeev ◽  
S.A. Gudkova ◽  
A.G. Chernikova ◽  
A.S. Mityaev ◽  
...  

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