Titanium Dioxide Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition for OLED Passivation
2008 ◽
Vol 8
(9)
◽
pp. 4726-4729
◽
Keyword(s):
Plasma enhanced atomic layer deposition (PEALD) of titanium dioxide thin films was conducted using Tetrakis dimethylamino titanium (TDMATi) and an oxygen plasma on a polyethersulfon (PES) substrate at a deposition temperature of 90 °C. The effects of the induced plasma power on passivation properties were investigated according to film thickness. The growth rate of the titanium dioxide film was 0.8 Å/cycle, and the water vapor transmission rate (WTVR) for a 80 nm titanium dioxide film was 0.023 g/m2·day. The passivation performance of the titanium dioxide film was investigated using an organic light-emitting diode (OLED). The coated OLED lifetime was 90 h, 15 times longer than that of an uncoated sample.
2010 ◽
Vol 4
(3)
◽
pp. 379-383
◽
Keyword(s):
2009 ◽
Vol 113
(52)
◽
pp. 21825-21830
◽
Keyword(s):
2016 ◽
Vol 8
(2)
◽
pp. 336-341
◽
2017 ◽
Vol 32
(9)
◽
pp. 093005
◽
Keyword(s):
2010 ◽
Vol 257
(1)
◽
pp. 186-191
◽
2013 ◽
Vol 86
(3)
◽
pp. 326-331
◽
Keyword(s):
Keyword(s):
Keyword(s):