Enhancement of characteristics of ZnO thin film surface acoustic wave device on glass substrate by introducing an alumina film interlayer

2012 ◽  
Vol 258 (14) ◽  
pp. 5424-5428 ◽  
Author(s):  
Wen-Ching Shih ◽  
Tzyy-Long Wang ◽  
Yan-Kai Pen
2004 ◽  
Vol 85 (10) ◽  
pp. 1757-1759 ◽  
Author(s):  
A. K. Sarin Kumar ◽  
P. Paruch ◽  
J.-M. Triscone ◽  
W. Daniau ◽  
S. Ballandras ◽  
...  

2007 ◽  
Vol 46 (7B) ◽  
pp. 4754-4759 ◽  
Author(s):  
Nobuaki Murochi ◽  
Mitsunori Sugimoto ◽  
Yoshikazu Matsui ◽  
Jun Kondoh

2014 ◽  
Vol 104 (21) ◽  
pp. 213504 ◽  
Author(s):  
Xingli He ◽  
Hongwei Guo ◽  
Jinkai Chen ◽  
Wenbo Wang ◽  
Weipeng Xuan ◽  
...  

2021 ◽  
pp. 2141004
Author(s):  
Walter Water ◽  
Yu-Zhen Shi

The TiO2 thin film was grown on a [Formula: see text] Y-axis cut, X-axis propagation lithium niobate substrate by radio frequency magnetron sputtering to fabricate a surface acoustic wave device. The sputtering ratios of argon to oxygen at 20% and post-annealing temperature at [Formula: see text]C for 3 h were controlled to improve the photocatalytic activity of TiO2 thin film. The effects of work frequency and input voltage of the surface acoustic wave device on the methylene blue photocatalytic degradation efficiency of the TiO2 thin film were investigated. The TiO2 thin film was vibrated at radio frequency by surface acoustic wave device to increase the scattering and reactive frequency for methylene blue in liquid. The surface acoustic wave device operated at 28.65 MHz work frequency and 0.95 V input voltage revealed the highest photocatalytic degradation efficiency of methylene blue. Compared to the TiO2 thin film combined with and without surface acoustic wave device, the surface acoustic wave device enhanced the TiO2 thin film photocatalytic degradation efficiency to 46%.


Sign in / Sign up

Export Citation Format

Share Document