Characterization of HfO N thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N2 plasmas

2015 ◽  
Vol 349 ◽  
pp. 757-762 ◽  
Author(s):  
Young Bok Lee ◽  
Il-Kwon Oh ◽  
Edward Namkyu Cho ◽  
Pyung Moon ◽  
Hyungjun Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Formation ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Thin Film Formation

Characterization of Ru thin-film conductivity upon atomic layer deposition on H-passivated Si(111)

2012 ◽  
Vol 112 (11) ◽  
pp. 113517 ◽  
Author(s):  
K. Roodenko ◽  
S. K. Park ◽  
J. Kwon ◽  
L. Wielunski ◽  
Y. J. Chabal
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Film Conductivity

In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer Deposition

2011 ◽  
Vol 11 (2) ◽  
pp. 1577-1580 ◽  
Author(s):  
Yong Jun Park ◽  
Dong Ryeol Lee ◽  
Hyun Hwi Lee ◽  
Han-Bo-Ram Lee ◽  
Hyungjun Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
X Ray ◽  
X Ray Scattering ◽  
Layer Deposition ◽  
Scattering Study

Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing

2015 ◽  
Vol 815 ◽  
pp. 8-13
Author(s):  
Chun Min Zhang ◽  
Xiao Yong Liu ◽  
Lin Qing Zhang ◽  
Hong Liang Lu ◽  
Peng Fei Wang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Thermal Processing ◽  
Oxygen Plasma ◽  
Film Formation ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Line Process ◽  
Formation Method ◽  
Thin Film Formation

A novel Ru thin film formation method was proposed to deposit metallic Ru thin films on TiN substrate for future backend of line process in semiconductor technologies. RuO2 thin films were first grown on TiN substrate by oxygen plasma-enhanced atomic layer deposition technique. The deposited RuO2 thin films were then reduced into metallic Ru thin films by H2/N2-assisted annealing.

Resistive switching of in situ and ex situ oxygen plasma treated ZnO thin film deposited by atomic layer deposition

2014 ◽  
Vol 116 (2) ◽  
pp. 663-669 ◽  
Author(s):  
Jian Zhang ◽  
Hui Yang ◽  
Qilong Zhang ◽  
Hao Jiang ◽  
Jikui Luo ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Resistive Switching ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Ex Situ ◽  
Zno Thin Film ◽  
Layer Deposition
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