scholarly journals Synthesis of vanadium oxides by pulsed laser deposition and rapid thermal annealing

2020 ◽  
Vol 521 ◽  
pp. 146267 ◽  
Author(s):  
Erieta-Katerina Koussi ◽  
Florent Bourquard ◽  
Teddy Tite ◽  
Damien Jamon ◽  
Florence Garrelie ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Pulsed Laser ◽  
Vanadium Oxides ◽  
Laser Deposition

SrTiO3 Thin Films Deposition Using Pulsed Laser Deposition Technique

2013 ◽  
Vol 789 ◽  
pp. 72-75
Author(s):  
Pia Dinari ◽  
Christian Chandra ◽  
Joko Suwardy ◽  
Salim Mustofa ◽  
Yudi Darma
Keyword(s):  
Pulsed Laser Deposition ◽  
Thermal Annealing ◽  
Pulsed Laser ◽  
Film Deposition ◽  
Laser Deposition ◽  
Deposition Technique ◽  
X Ray Diffraction ◽  
Si Substrate ◽  
Thermal Annealing Process ◽  
Thermal Stability Of

Strontium titanate (SrTiO3) thin film has been deposited on Si (100) substrate using pulsed laser deposition technique. Film deposition was carried out at low temperature (150°C) by maintained the pressure at 10-4 Torr. Nanometer-thick SrTiO3 film on Si substrate was characterized using SEM, AFM, XRD, and Raman Spectroscopy. SEM and AFM images show that SrTiO3 film has growth on Si substrate uniformly. Raman and XRD spectroscopy also support the growth of SrTiO3 film on Si substrate. Furthermore, to investigate the effect of post-deposition thermal annealing, the samples were annealed up to 900°C. Thermal stability of SrTiO3/Si structure was studied by mean XRD spectra. The X-Ray Diffraction pattern indicates the crystallinity improvement through atomic arrangements during thermal annealing process.

Fabrication of Copper-Indium-Disulfide Films onto Mo/Glass Substrates Using Pulsed Laser Deposition

2002 ◽  
Vol 730 ◽  
Author(s):  
R. Mu ◽  
M.H. Wu ◽  
Y. C. Liu ◽  
A. Ueda ◽  
D.O. Henderson ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Thermal Annealing ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Copper Indium Disulfide ◽  
Glass Substrates ◽  
Pure Silica ◽  
Copper Indium ◽  
Deposited Film

AbstractPico-second pulsed laser deposition (PLD) was employed to fabricate copper indium disulfide (CIS) thin films onto pure silica and Mo coated glass substrates. By properly preparing the target materials and controlling the elemental ratio of the Cu, In and S in the deposited film followed by post-thermal annealing, good quality copper-indium-disulfide(CIS) films can be obtained. A series of characterizations were conducted including XRD, RBS, IR, UV-Vis, AFM and STM analyses.

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