Drastic improvement of as-sputtered silicon nitride thin film quality at room temperature by ArF excimer-laser annealing method
2016 ◽
Vol 16
(8)
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pp. 876-885
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1994 ◽
Vol 41
(10)
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pp. 1876-1879
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1998 ◽
Vol 166
(2)
◽
pp. 715-728
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2007 ◽
pp. 371-374
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