Effective generation of atmospheric pressure plasma in a sandwich-type honeycomb monolith reactor by humidity control

2020 ◽  
Vol 401 ◽  
pp. 125970 ◽  
Author(s):  
Duc Ba Nguyen ◽  
Saud Shirjana ◽  
Md. Mokter Hossain ◽  
Iljeong Heo ◽  
Young Sun Mok
PIERS Online ◽  
2010 ◽  
Vol 6 (7) ◽  
pp. 636-639
Author(s):  
Toshiyuki Nakamiya ◽  
Fumiaki Mitsugi ◽  
Shota Suyama ◽  
Tomoaki Ikegami ◽  
Yoshito Sonoda ◽  
...  

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.


2018 ◽  
Vol 677 (1) ◽  
pp. 135-142
Author(s):  
Dong Ha Kim ◽  
Choon-Sang Park ◽  
Eun Young Jung ◽  
Bhum Jae Shin ◽  
Jae Young Kim ◽  
...  

Author(s):  
Thisara Sandanuwan ◽  
Nayanathara Hendeniya ◽  
D.A.S. Amarasinghe ◽  
Dinesh Attygalle ◽  
Sampath Weragoda

Author(s):  
Kenneth A. Cornell ◽  
Amanda White ◽  
Adam Croteau ◽  
Jessica Carlson ◽  
Zeke Kennedy ◽  
...  

AIP Advances ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 055118
Author(s):  
Xuezhi Tang ◽  
Qi Shi ◽  
Zhixiang Zhang ◽  
Hanyong Zhang ◽  
Tianfeng Du ◽  
...  

Micromachines ◽  
2021 ◽  
Vol 12 (6) ◽  
pp. 683
Author(s):  
Huiliang Jin ◽  
Caixue Tang ◽  
Haibo Li ◽  
Yuanhang Zhang ◽  
Yaguo Li

The continuous phase plate (CPP) is the vital diffractive optical element involved in laser beam shaping and smoothing in high-power laser systems. The high gradients, small spatial periods, and complex features make it difficult to achieve high accuracy when manufacturing such systems. A high-accuracy and high-efficiency surface topography manufacturing method for CPP is presented in this paper. The atmospheric pressure plasma jet (APPJ) system is presented and the removal characteristics are studied to obtain the optimal processing parameters. An optimized iterative algorithm based on the dwell point matrix and a fast Fourier transform (FFT) is proposed to improve the accuracy and efficiency in the dwell time calculation process. A 120 mm × 120 mm CPP surface topography with a 1326.2 nm peak-to-valley (PV) value is fabricated with four iteration steps after approximately 1.6 h of plasma processing. The residual figure error between the prescribed surface topography and plasma-processed surface topography is 28.08 nm root mean square (RMS). The far-field distribution characteristic of the plasma-fabricated surface is analyzed, for which the energy radius deviation is 11 μm at 90% encircled energy. The experimental results demonstrates the potential of the APPJ approach for the manufacturing of complex surface topographies.


Sign in / Sign up

Export Citation Format

Share Document