Densification of silicon dioxide formed by plasma-enhanced atomic layer deposition on 4H-silicon carbide using argon post-deposition annealing
2018 ◽
Vol 44
(12)
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pp. 13565-13571
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2005 ◽
Vol 44
(4B)
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pp. 2230-2234
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Keyword(s):
Keyword(s):
Keyword(s):
Keyword(s):
2012 ◽
Vol 51
(2S)
◽
pp. 02BA04
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