Optical and structural properties of single source precursor based pure and Cu-doped antimony sulphide thin films by physical vapour deposition assisted technique

2020 ◽  
Vol 539 ◽  
pp. 110979 ◽  
Author(s):  
Sara Majid ◽  
Khuram Shahzad Ahmad ◽  
Shania Sharif
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Vapour Deposition ◽  
Physical Vapour Deposition ◽  
Single Source ◽  
Single Source Precursor

scholarly journals [Ge(TenBu)4] – a single source precursor for the chemical vapour deposition of germanium telluride thin films

2019 ◽  
Vol 48 (1) ◽  
pp. 117-124 ◽  
Author(s):  
Samantha L. Hawken ◽  
Ruomeng Huang ◽  
C. H. (Kees) de Groot ◽  
Andrew L. Hector ◽  
Marek Jura ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Germanium Telluride ◽  
Single Source Precursor

Reaction of activated germanium with nBu2Te2 in THF solution was shown to be more effective for the preparation of the germanium(iv) tellurolate compound, [Ge(TenBu)4], than reaction of GeCl4 with LiTenBu in THF.

scholarly journals High-performance perovskite CH3NH3PbI3 thin films for solar cells prepared by single-source physical vapour deposition

2016 ◽  
Vol 6 (1) ◽  
Author(s):  
Ping Fan ◽  
Di Gu ◽  
Guang-Xing Liang ◽  
Jing-Ting Luo ◽  
Ju-Long Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
High Performance ◽  
Vapour Deposition ◽  
Physical Vapour Deposition ◽  
Single Source

Homoleptic zirconium amidates: single source precursors for the aerosol-assisted chemical vapour deposition of ZrO2

2016 ◽  
Vol 4 (45) ◽  
pp. 10731-10739 ◽  
Author(s):  
Amanda L. Catherall ◽  
Michael S. Hill ◽  
Andrew L. Johnson ◽  
Gabriele Kociok-Köhn ◽  
Mary F. Mahon
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursors ◽  
Single Source Precursor ◽  
Original Family

We report the development of a true single source precursor for the growth of zirconia thin films by aerosol-assisted chemical vapour deposition using an original family of zirconium(iv) amidate derivatives.

Fabrication of copper–zinc oxide composite thin films from single source precursor by aerosol assisted chemical vapour deposition

Polyhedron ◽  
2008 ◽  
Vol 27 (16) ◽  
pp. 3337-3342 ◽  
Author(s):  
Muhammad Shahid ◽  
Muhammad Mazhar ◽  
Mohammad A. Malik ◽  
Paul O’ Brien ◽  
James Raftery
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Oxide Composite ◽  
Single Source Precursor ◽  
Copper Zinc ◽  
Copper Zinc Oxide

scholarly journals Bis(piperidinedithiocarbamato)pyridinecadmium(ii) as a single-source precursor for the synthesis of CdS nanoparticles and aerosol-assisted chemical vapour deposition (AACVD) of CdS thin films

2014 ◽  
Vol 38 (12) ◽  
pp. 6073-6080 ◽  
Author(s):  
Sixberth Mlowe ◽  
David J. Lewis ◽  
M. Azad Malik ◽  
James Raftery ◽  
Egid B. Mubofu ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Cds Nanoparticles ◽  
Single Source ◽  
Dithiocarbamate Complex ◽  
Single Source Precursor ◽  
Cds Thin Films

The pyridine adduct of a cadmium piperidine dithiocarbamate complex was used to deposit CdS thin films and for the synthesis of CdS nanoparticles.

ZnFe2O4 thin films from a single source precursor by aerosol assisted chemical vapour deposition

2010 ◽  
Vol 518 (14) ◽  
pp. 3664-3668 ◽  
Author(s):  
Asif Ali Tahir ◽  
K.G.U. Wijayantha ◽  
Muhammad Mazhar ◽  
Vickie McKee
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursor

Deposition of II/VI thin films from Novel Single-Source Precursors

2002 ◽  
Vol 744 ◽  
Author(s):  
Mohammad Afzaal ◽  
Mohammad Azad Malik ◽  
Paul O'Brien ◽  
Jin-Ho Park
Keyword(s):  
Thin Films ◽  
Cadmium Selenide ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Deposition Process ◽  
Single Source ◽  
X Ray ◽  
Single Source Precursor ◽  
Pressure Chemical ◽  
Deposited Films

ABSTRACTThe compound [MeCd(SePiPr2)2N]2 is used as a single-source precursor to cadmium selenide films in a low-pressure chemical vapour deposition process. Thermogravimetric analysis (TGA) shows that the precursor is reasonably volatile, making it suitable for the deposition of thin films. As-deposited films were identified as CdSe confirmed by X-ray powder diffraction (XRPD) and their morphologies were studied by scanning electron microscope (SEM).

Phase pure Ni3S2 and NiS from bis(N′-ethyl-N-piperazinylcarbodithioato-S,S′)–nickel(ii) via solvent thermolysis and aerosol assisted chemical vapour deposition

2018 ◽  
Vol 42 (8) ◽  
pp. 6203-6209 ◽  
Author(s):  
Charles Gervas ◽  
Sixberth Mlowe ◽  
Matthew P. Akerman ◽  
Neerish Revaprasadu
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Nickel Sulfide ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Source ◽  
Single Source Precursor ◽  
Phase Pure

We report the structure of a triclinic bis(N′-ethyl-N-piperazinylcarbodithioato-S,S′)–nickel(ii) complex and its use as a single source precursor for the synthesis of nickel sulfide thin films and nanoparticles.

MOCVD of Aluminum Nitride Thin Films with a New Type of Single-Source Precursor: AlCl3:tBuNH2.

ChemInform ◽  
2003 ◽  
Vol 34 (9) ◽  
Author(s):  
Oh-Shim Joo ◽  
Kwang-Deog Jung ◽  
Sung-Hoon Cho ◽  
Je-Hong Kyoung ◽  
Chang-Kyu Ahn ◽  
...  
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Single Source ◽  
Single Source Precursor ◽  
New Type
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