Application of pulsed chemical vapor deposition on the SiO2-coated TiO2 production within a rotary reactor at room temperature
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2000 ◽
Vol 39
(Part 1, No. 7A)
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pp. 3860-3862
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2014 ◽
Vol 244
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pp. 98-108
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Keyword(s):
Keyword(s):