Amination of diamond film by ammonia microwave plasma treatment

2015 ◽  
Vol 54 ◽  
pp. 34-38 ◽  
Author(s):  
J.J. Wei ◽  
J.L. Liu ◽  
L.X. Chen ◽  
L.F. Hei ◽  
F.X. Lv ◽  
...  
Author(s):  
V. V. Azharonok ◽  
I. I. Filatova ◽  
A. P. Dostanko ◽  
S. V. Bordusov ◽  
Yu. S. Shynkevich

2011 ◽  
Vol 117-119 ◽  
pp. 1310-1314
Author(s):  
Xing Rui Li ◽  
Xin Wei Shi ◽  
Ning Yao ◽  
Xin Chang Wang

Nano-crystalline diamond (NCD) films with good adhesion were deposited on flexible copper substrate with Ni interlayer by Microwave Plasma Chemical Vapor Deposition (MPCVD). In this paper, two-stage method was used to improve the adhesion between the copper substrates and the diamond films. The effect of deposition time of the first stage on the morphology, crystal structure, non-diamond phase and adhesive properties of diamond films was investigated. The performance and structure of the diamond films were studied by Scanning Electron Microscope (SEM), Raman Spectroscopy (Raman) and X-Ray Diffraction (XRD). The results showed that the films were nano-crystalline diamond films positively. Impress method was used to examine the adhesion between diamond film and the substrate. When deposition time is 1.5h, the adhesion between diamond film and the copper substrate is better than the others. When it was 2.5h or longer, because the graphite layers existed as intermediate, the adherence between the diamond films and copper substrates was very poor. Therefore, the diamond films were easily peeled off from the substrates. Otherwise, the second stage called annealing process after the deposition played an important role to the adhesion. The films would be easily peeled off by curling without the annealing process.


2002 ◽  
Vol 11 (3-6) ◽  
pp. 562-566 ◽  
Author(s):  
M. Nagatsu ◽  
M. Makino ◽  
M. Tanga ◽  
H. Sugai

1989 ◽  
Vol 43 (7) ◽  
pp. 1153-1158 ◽  
Author(s):  
Yaoming Xie ◽  
Peter M. A. Sherwood

X-ray photoelectron spectroscopy has been used to monitor the surface chemical changes occurring on type II carbon fibers exposed to air, oxygen, and nitrogen plasmas. In all cases the plasmas caused changes in surface functionality, in terms of both C-O and C-N functionality. Prolonged exposure to the plasmas caused loss of surface functionality for air and oxygen plasmas, and extended treatment caused fiber damage. Plasma treatment of fibers promises to be an effective method of fiber treatment.


Lab on a Chip ◽  
2005 ◽  
Vol 5 (10) ◽  
pp. 1173 ◽  
Author(s):  
Alex Y. N. Hui ◽  
Gang Wang ◽  
Bingcheng Lin ◽  
Wing-Tat Chan

1996 ◽  
Vol 47 (7) ◽  
pp. 611-615
Author(s):  
Hiroyuki TANAKA ◽  
Toshiaki TANAKA ◽  
Hideaki SOHMA ◽  
Masato YOSHIDA ◽  
Akira SAKAI ◽  
...  

1990 ◽  
Vol 39 (10) ◽  
pp. 1635
Author(s):  
SONG RU-AN ◽  
CHENG XIAN-AN ◽  
ZHOU ZHONG-YI

Sign in / Sign up

Export Citation Format

Share Document