Effects of chamber pressure on the kinematic characteristics of spray flows exhausted from an airblast atomizer

2022 ◽  
Vol 130 ◽  
pp. 110514
Author(s):  
Zichen Zhang ◽  
Yang Liu ◽  
Hui Hu
Keyword(s):  
Chamber Pressure ◽  
Kinematic Characteristics ◽  
Spray Flows

Residual Gas Reaction in the Electron Microscope: II The Design of a Gas-Control Chamber for Quantitative Observations

1969 ◽  
Vol 27 ◽  
pp. 82-83
Author(s):  
Chester J. Calbick ◽  
Richard E. Hartman
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Local Environment ◽  
Chamber Pressure ◽  
Objective Lens ◽  
Ion Pump ◽  
Quantitative Studies ◽  
Precise Knowledge ◽  
Differential Pumping ◽  
And Control

Quantitative studies of the phenomenon associated with reactions induced by the electron beam between specimens and gases present in the electron microscope require precise knowledge and control of the local environment experienced by the portion of the specimen in the electron beam. Because of outgassing phenomena, the environment at the irradiated portion of the specimen is very different from that in any place where gas pressures and compositions can be measured. We have found that differential pumping of the specimen chamber by a 4" Orb-Ion pump, following roughing by a zeolite sorption pump, can produce a specimen-chamber pressure 100- to 1000-fold less than that in the region below the objective lens.

Studies of the scanning ion beam sputter-cleaned MgO crystal surface by scanning reflection electron microscopy

1987 ◽  
Vol 45 ◽  
pp. 144-145
Author(s):  
H.-J. Ou ◽  
J. M. Cowley ◽  
A. A. Higgs
Keyword(s):  
Crystal Surface ◽  
Ion Beam ◽  
Carbon Film ◽  
Surface Region ◽  
Bulk Sample ◽  
Chamber Pressure ◽  
Specimen Preparation ◽  
Detailed Surface ◽  
Gate Control ◽  
Reflection Electron Microscopy

A scanning ion gun system has been installed on the specimen preparation chamber (pressure ∼5xl0-8 torr) of the VG-HB5 STEM microscope. By using the specimen current imaging technique, it is possible to use an ion beam to sputter-clean the preferred surface region on a bulk sample. As shown in figure 1, the X-Y raster-gate control of the scanning unit for the Krato Mini-Beam I is used to minimize the beam raster area down to a 800μm x800μm square region. With beam energy of 2.5KeV, the MgO cleavage surface has been ion sputter-cleaned for less than 1 minute. The carbon film or other contaminant, introduced during the cleavage process in air, is mostly removed from the MgO crystal surfaces.The immediate SREM inspection of this as-cleaned MgO surface, within the adjacent STEM microscope, has revealed the detailed surface structures of atomic steps, which were difficult to observe on the as-cleaved MgO surfaces in the previous studies.

Electron behavior in the gaseous environment of the ESEM chamber

1996 ◽  
Vol 54 ◽  
pp. 838-839 ◽  
Author(s):  
S.A. Wight
Keyword(s):  
Secondary Electron ◽  
High Vacuum ◽  
Beam Current ◽  
Chamber Pressure ◽  
Environmental Scanning ◽  
Carbon Block ◽  
Faraday Cup ◽  
X Ray ◽  
Gaseous Environment ◽  
Working Distance

Measurements of electrons striking the sample in the Environmental Scanning Electron Microscope (ESEM) are needed to begin to understand the effect of the presence of the gas on analytical measurements. Accurate beam current is important to x-ray microanalysis and it is typically measured with a faraday cup. A faraday cup (Figure 1) was constructed from a carbon block embedded in non-conductive epoxy with a 45 micrometer bore platinum aperture over the hole. Currents were measured with an electrometer and recorded as instrument parameters were varied.Instrument parameters investigated included working distance, chamber pressure, condenser percentage, and accelerating voltage. The conditions studied were low vacuum with gaseous secondary electron detector (GSED) voltage on; low vacuum with GSED voltage off; and high vacuum (GSED off). The base conditions were 30 kV, 667 Pa (5 Torr) water vapor, 100,000x magnification with the beam centered inside aperture, GSED voltage at 370 VDC, condenser at 50%, and working distance at 19.5 mm. All modifications of instrument parameters were made from these conditions.

KINEMATIC FEATURES OF THE LAPPING PROCESS AND DETERMINATION OF ITS BASIC PARAMETERS

2020 ◽  
Vol 7 (3) ◽  
pp. 23-28
Author(s):  
EZIZ SARVAN SHIRVAN ◽  
Keyword(s):  
Dynamic Properties ◽  
Cutting Speed ◽  
Equilibrium System ◽  
Technological Parameters ◽  
Kinematic Characteristics ◽  
Angular Velocities ◽  
Basic Parameters ◽  
Grinding Tool ◽  
Mathematical Relationships ◽  
Analytical Expressions

This paper discusses the kinematic characteristics of lapping process and the main parameters of the process. It was determined that the influencing degree of technological parameters to the forming surface and processes. It was projected the construction of the lapping head for processing of internal cylindrical surfaces, scheme of the lapping operation and graphic description of the forces influencing. The relationships between the axial, radial and tangential cutting forces and the effect of the combined force thereof are determined in order to ensure the necessary surface pressure. During the analysis geometric and mathematical relationships were obtained. The extracted analytical expressions can be realized by further experimental researches and can be used in engineering calculations of technological parameters of processing by lapping. Angular velocity, friction force, linear velocity, also the length of the tactile curve and the radius of the part can be considered the main kinematic and dynamic parameters of the process that the formation of the surface, also the course of the process depends on these parameters. Depending on the kinematic parameters, the wear nature of the tool changes and this changes the linear and angular velocities, which have a significant impact on the accuracy, quality and productivity of processing. When examining the technological capabilities of the process, the nature of the movement between the part and the grinding tool, also changes in cutting speed are often considered as a main factor. Analytical expressions were obtained to determine the main parameters of the process, taking into account the kinematic characteristics of the friction process. These expressions can be used in engineering calculations and allow to determine the optimal values of the processing mode. In order to obtain the required micrometric surface cleanliness and measurement accuracy, correlation relationships were established between the main parameters of the process, equations of the equilibrium system of shear forces were compiled and analytical expressions were obtained based on the analysis of kinematic and dynamic properties of the system.

Nanocrystalline silicon ( nc-Si ) from single ion beam sputtering

2003 ◽  
Vol 762 ◽  
Author(s):  
Z.B. Zhou ◽  
G.M. Hadi ◽  
R.Q. Cui ◽  
Z.M. Ding ◽  
G. Li
Keyword(s):  
Solar Cell ◽  
Ion Beam ◽  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Chamber Pressure ◽  
Ion Beam Sputtering ◽  
High Hydrogen ◽  
Beam Sputtering ◽  
Si Films ◽  
Nanocrystalline Silicon Films

AbstractBased on a small set of selected publications on the using of nanocrystalline silicon films (nc-Si) for solar cell from 1997 to 2001, this paper reviews the application of nc-Si films as intrinsic layers in p-i-n solar cells. The new structure of nc-Si films deposited at high chamber pressure and high hydrogen dilution have characters of nanocrystalline grains with dimension about several tens of nanometer embedded in matrix of amorphous tissue and a high volume fraction of crystallinity (60~80%). The new nc-Si material have optical gap of 1.89 eV. The efficiency of this single junction solar cell reaches 8.7%. This nc-Si layer can be used not only as an intrinsic layer and as a p-type layer. Also nanocrystalline layer may be used as a seed layer for the growth of polycrystalline Si films at a low temperature.We used single ion beam sputtering methods to synthesize nanocrystalline silicon films successfully. The films were characterized with the technique of X-ray diffraction, Atomic Force Micrographs. We found that the films had a character of nc-amorphous double phase structure. Conductivity test at different temperatures presented the transportation of electrons dominated by different mechanism within different temperature ranges. Photoconductivity gains of the material were obtained in our recent investigation.

TOWARD A COMPREHENSIVE THEORY OF DENSE SPRAY FLOWS

2000 ◽  
Vol 10 (3-5) ◽  
pp. 335-353 ◽  
Author(s):  
Christopher F. Edwards
Keyword(s):  
Comprehensive Theory ◽  
Spray Flows

A DISCUSSION ON THE STOCHASTIC MODELING OF SPRAY FLOWS

2009 ◽  
Vol 19 (12) ◽  
pp. 1171-1191 ◽  
Author(s):  
Mark Archambault
Keyword(s):  
Stochastic Modeling ◽  
Spray Flows

Evaluation of Combustion Chamber Pressure of 1N-Class Green Monopropellant Thruster with Discharge Plasma System

2017 ◽  
Vol 65 (3) ◽  
pp. 117-122
Author(s):  
Asato WADA ◽  
Hiroshi MAEDA ◽  
Takahiro SHINDO ◽  
Hiroki WATANABE ◽  
Haruki TAKEGAHARA
Keyword(s):  
Combustion Chamber ◽  
Discharge Plasma ◽  
Chamber Pressure ◽  
Plasma System

A Maximum Entropy Moment Closure Approach to Describing Spray Flows

1998 ◽  
Author(s):  
M. Archambault ◽  
R. W. MacCormack ◽  
C. F. Edwards
Keyword(s):  
Maximum Entropy ◽  
Moment Closure ◽  
Spray Flows

Preliminary Studies on Non-Reactive Flow Vortex Cooling

2019 ◽  
Vol 12 (3) ◽  
pp. 262-271
Author(s):  
T.N. Rajesh ◽  
T.J.S. Jothi ◽  
T. Jayachandran
Keyword(s):  
Combustion Chamber ◽  
Inner Core ◽  
Rocket Engine ◽  
Injection Pressure ◽  
Chamber Pressure ◽  
Reactive Flow ◽  
Stoichiometric Ratio ◽  
Gaseous Oxygen ◽  
Mixture Ratio ◽  
Vortex Combustion

Background: The impulse for the propulsion of a rocket engine is obtained from the combustion of propellant mixture inside the combustion chamber and as the plume exhausts through a convergent- divergent nozzle. At stoichiometric ratio, the temperature inside the combustion chamber can be as high as 3500K. Thus, effective cooling of the thrust chamber becomes an essential criterion while designing a rocket engine. Objective: A new cooling method of thrust chambers was introduced by Chiaverni, which is termed as Vortex Combustion Cold-Wall Chamber (VCCW). The patent works on cyclone separators and confined vortex flow mechanism for providing high propellant mixing with improved degree of turbulence inside the combustion chamber, providing the required notion for studies on VCCW. The flow inside a VCCW has a complex structure characterised by axial pressure losses, swirl velocities, centrifugal force, flow reversal and strong turbulence. In order to study the flow phenomenon, both the experimental and numerical investigations are carried out. Methods: In this study, non-reactive flow analysis was conducted with real propellants like gaseous oxygen and hydrogen. The test was conducted to analyse the influence of mixture ratio and injection pressure of the propellants on the chamber pressure in a vortex combustion chamber. A vortex combustor was designed in which the oxidiser injected tangentially at the aft end near the nozzle spiraled up to the top plate and formed an inner core inside the chamber. The fuel was injected radially from injectors provided near the top plate and the propellants were mixed in the inner core. This resulted in enhanced mixing and increased residence time for the fuel. More information on the flow behaviour has been obtained by numerical analysis in Fluent. The test also investigated the sensitivity of the tangential injection pressure on the chamber pressure development. Results: All the test cases showed an increase in chamber pressure with the mixture ratio and injection pressure of the propellants. The maximum chamber pressure was found to be 3.8 bar at PC1 and 2.7 bar at PC2 when oxidiser to fuel ratio was 6.87. There was a reduction in chamber pressure of 1.1 bar and 0.7 bar at PC1 and PC2, respectively, in both the cases when hydrogen was injected. A small variation in the pressure of the propellant injected tangentially made a pronounced effect on the chamber pressure and hence vortex combustion chamber was found to be very sensitive to the tangential injection pressure. Conclusion: VCCW mechanism has been to be found to be very effective for keeping the chamber surface within the permissible limit and also reducing the payload of the space vehicle.

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