The engineering design of quarter size negative beam source for the comprehensive research facility for fusion technology

2021 ◽  
Vol 171 ◽  
pp. 112600
Author(s):  
Yuming Gu ◽  
Yahong Xie ◽  
Jianglong Wei ◽  
Jun Li ◽  
Lizhen Liang ◽  
...  
2021 ◽  
Vol 172 ◽  
pp. 112781
Author(s):  
Kun Wang ◽  
Jianzhong Ma ◽  
Xiang Zhang ◽  
Hong Zhu ◽  
Cunwen Tang ◽  
...  

Energies ◽  
2021 ◽  
Vol 14 (21) ◽  
pp. 7354
Author(s):  
Xiaoman Cheng ◽  
Zihan Liu ◽  
Songlin Liu ◽  
Changhong Peng ◽  
Wenjia Wang ◽  
...  

As one of the tasks of the Comprehensive Research Facility for Fusion Technology (CRAFT), a High Heat Flux (HHF) testing device will be built to test the blanket and divertor of Chinese Fusion Engineering Testing Reactor (CFETR). The water loop is a key system of the HHF testing device. The main objective of the water loop is to provide deionized water at specific temperature, pressure, and flow rate for different testing experiments of the water-cooled blanket and water-cooled divertor components. The design of the water loop has been through three major steps. Firstly, the water cooled blanket and divertor were designed and analyzed, in detail, for CFETR. Secondly, thermal hydraulic features of the prototypes were abstracted from the analyses results. Then, the experiment plan was made so that the preliminary design of the water loop was carried out. The third step was the engineering design, which was conducted through cooperation with an industrial enterprise with certifications. At present, the water loop is ready for fabrication and construction. The water loop will be completed, for commissioning operation, by August 2022, as scheduled. After that, the experiments will be carried out step by step and provide solid technical base to CFETR.


Author(s):  
Michael T. Postek

The term ultimate resolution or resolving power is the very best performance that can be obtained from a scanning electron microscope (SEM) given the optimum instrumental conditions and sample. However, as it relates to SEM users, the conventional definitions of this figure are ambiguous. The numbers quoted for the resolution of an instrument are not only theoretically derived, but are also verified through the direct measurement of images on micrographs. However, the samples commonly used for this purpose are specifically optimized for the measurement of instrument resolution and are most often not typical of the sample used in practical applications.SEM RESOLUTION. Some instruments resolve better than others either due to engineering design or other reasons. There is no definitively accurate definition of how to quantify instrument resolution and its measurement in the SEM.


1988 ◽  
Vol 49 (C4) ◽  
pp. C4-607-C4-614
Author(s):  
R. J. MALIK ◽  
A. F.J. LEVI ◽  
B. F. LEVINE ◽  
R. C. MILLER ◽  
D. V. LANG ◽  
...  

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