Structural, optical and dispersion energy parameters of nickel oxide nanocrystalline thin films prepared by electron beam deposition technique

2015 ◽  
Vol 646 ◽  
pp. 937-945 ◽  
Author(s):  
M.M. El-Nahass ◽  
M. Emam-Ismail ◽  
M. El-Hagary
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Nickel Oxide ◽  
Deposition Technique ◽  
Dispersion Energy ◽  
Energy Parameters ◽  
Electron Beam Deposition ◽  
Nanocrystalline Thin Films ◽  
Beam Deposition

Electron-beam deposition of vanadium dioxide thin films

2012 ◽  
Vol 111 (3) ◽  
pp. 975-981 ◽  
Author(s):  
R. E. Marvel ◽  
K. Appavoo ◽  
B. K. Choi ◽  
J. Nag ◽  
R. F. Haglund
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Vanadium Dioxide ◽  
Electron Beam Deposition ◽  
Vanadium Dioxide Thin Films ◽  
Beam Deposition

Electrochromic properties of manganese oxide (MnOx) thin films made by electron beam deposition

1993 ◽  
Author(s):  
Olof Erlandsson ◽  
Johannes Lindvall ◽  
Ngoc T. Nguyen ◽  
Van H. Nguyen ◽  
Thi Bich Vu ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Manganese Oxide ◽  
Electrochromic Properties ◽  
Electron Beam Deposition ◽  
Beam Deposition

XRD Investigation of Residual Stresses in Electron Beam Deposited Pt-V Coatings

2010 ◽  
Vol 652 ◽  
pp. 303-308
Author(s):  
T.P. Ntsoane ◽  
M. Topic ◽  
R. Bucher
Keyword(s):  
Mechanical Properties ◽  
Electron Beam ◽  
X Rays ◽  
Deposition Technique ◽  
Layer System ◽  
Si Substrates ◽  
Coating Morphology ◽  
Electron Beam Deposition ◽  
Beam Deposition ◽  
Star Detector

Platinum and platinum alloys, due to their good electrical and mechanical properties, are commonly used in fields such as jewellery, catalysis and electronics. In this work, a two-layer system of Pt and V, deposited on Si substrates by electron beam deposition technique, were investigated amongst others for residual stress development in the coating. The investigation was carried out using diffraction techniques employing laboratory X-rays on the BRUKER D8 Discover instrument equipped with a High Star detector and analyzed with LEPTOS v6 software. The results showed the stress state to be tensile, relaxing significantly on annealing. In addition, complementary results of phase composition, and coating morphology will also be presented.

scholarly journals Poly(propylene)/carbon composite thin films obtained by pulsed electron-beam deposition

2018 ◽  
Vol 15 (7) ◽  
pp. 1700239 ◽  
Author(s):  
Roman Jędrzejewski ◽  
Joanna Piwowarczyk ◽  
Anna Jędrzejewska ◽  
Konrad Kwiatkowski ◽  
Jolanta Baranowska
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Carbon Composite ◽  
Composite Thin Films ◽  
Pulsed Electron Beam ◽  
Electron Beam Deposition ◽  
Poly Propylene ◽  
Propylene Carbon ◽  
Beam Deposition ◽  
Pulsed Electron Beam Deposition

Effects of Heat Treatment on TiO2 Sculptured Thin Films Birefringence Prepared by Electron Beam Deposition

2009 ◽  
Vol 36 (8) ◽  
pp. 2166-2170
Author(s):  
肖秀娣 Xiao Xiudi ◽  
董国平 Dong Guoping ◽  
邓淞文 Deng Songwen ◽  
邵建达 Shao Jianda ◽  
范正修 Fan Zhengxiu
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Electron Beam ◽  
Sculptured Thin Films ◽  
Electron Beam Deposition ◽  
Beam Deposition

Influence of Substrate Temperature on SiO2 Thin Films by Electron Beam Deposition

2014 ◽  
Vol 41 (10) ◽  
pp. 1007002
Author(s):  
杜倩倩 Du Qianqian ◽  
王文军 Wang Wenjun ◽  
李淑红 Li Shuhong ◽  
刘云龙 Liu Yunlong ◽  
和晓晓 He Xiaoxiao ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Substrate Temperature ◽  
Electron Beam Deposition ◽  
Influence Of Substrate ◽  
Beam Deposition

Preparation of New High-TcSuperconducting Oxide Bi-Sr-Ca-Cu-O Thin Film by Electron Beam Deposition Technique

1988 ◽  
Vol 27 (Part 2, No. 4) ◽  
pp. L625-L627 ◽  
Author(s):  
Kenichi Kuroda ◽  
Masashi Mukaida ◽  
Masafumi Yamamoto ◽  
Shintaro Miyazawa
Keyword(s):  
Thin Film ◽  
Electron Beam ◽  
Deposition Technique ◽  
Electron Beam Deposition ◽  
Beam Deposition

SYNTHESIS OF Fe NANOPARTICLES BY REDOX REACTION USING AN ELECTRON BEAM DEPOSITION TECHNIQUE

2004 ◽  
Vol 03 (04n05) ◽  
pp. 631-638 ◽  
Author(s):  
S. JAIN ◽  
S. Y. CHAN ◽  
A. O. ADEYEYE ◽  
C. B. BOOTHROYD
Keyword(s):  
Electron Beam ◽  
Buffer Layer ◽  
Enthalpy Of Formation ◽  
Photoelectron Spectroscopy ◽  
Profile Analysis ◽  
Deposition Technique ◽  
Electron Beam Deposition ◽  
Fe Nanoparticles ◽  
The Enthalpy Of Formation ◽  
Beam Deposition

A new technique for synthesizing Fe nanoparticles based on an electron beam deposition technique from a Fe 2 O 3 source has been developed. We deposited Fe 2 O 3 films directly on Si (001) substrates, Al and Cu buffer layer, and observed the formation of Fe nanoparticles at the Si (001) and Al interfaces respectively. The Al at the interface is oxidized to Al 2 O 3 and Si is oxidized to SiO 2. For films deposited on Cu buffer layer, however, no Fe nanoparticles were formed. We explain our results in terms of the enthalpy of formation of the oxides. The enthalpy of formation of SiO 2 and Al 2 O 3 is much lower than that of Fe 2 O 3, thus promoting the formation of Fe nanoparticles. The enthalpy of formation of CuO is however, greater than that of Fe 2 O 3 thus forbidding the formation of Fe nanoparticles. This is in agreement with both X-ray Photoelectron Spectroscopy (XPS) depth profile analysis and Transmission Electron Microscopy (TEM).

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