Effects of varying nitride concentration in Ar:N2 sputtering of indium-tin-oxide film for use as electrode in resistance switching device

2019 ◽  
Vol 808 ◽  
pp. 151654 ◽  
Author(s):  
Po-Hsun Chen ◽  
Huei-Jyun Shih ◽  
Philip Jwo Li
The Analyst ◽  
1995 ◽  
Vol 120 (10) ◽  
pp. 2579-2583 ◽  
Author(s):  
Xiaohua Cai ◽  
Božidar Ogorevc ◽  
Gabrijela Tavčar ◽  
Joseph Wang

2008 ◽  
Vol 47 (1) ◽  
pp. 197-201 ◽  
Author(s):  
Kwang Ho Kim ◽  
Sang Jik Kwon ◽  
Tae Oh Tak

Displays ◽  
2010 ◽  
Vol 31 (4-5) ◽  
pp. 191-195 ◽  
Author(s):  
Yen-Liang Chen ◽  
Hung-Chih Hsieh ◽  
Wang-Tsung Wu ◽  
Bor-Jiunn Wen ◽  
Wei-Yao Chang ◽  
...  

2018 ◽  
Vol 106 ◽  
pp. 259-264 ◽  
Author(s):  
Peng Liu ◽  
Wenjun Wang ◽  
Aifei Pan ◽  
Yang Xiang ◽  
Dapeng Wang

IEEE Access ◽  
2015 ◽  
Vol 3 ◽  
pp. 648-652 ◽  
Author(s):  
Elias A. Alwan ◽  
Asimina Kiourti ◽  
John L. Volakis

2021 ◽  
Vol 538 ◽  
pp. 148104
Author(s):  
Liping Peng ◽  
Yuan'an Zhao ◽  
Xiaofeng Liu ◽  
Zhaoliang Cao ◽  
Dawei Li ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document