Structural and Corrosion Resistance Properties of Sputtered Zirconium Nitride Thin Films as Electrode Material for Supercapacitor

In the past decade, many transition metal nitride thin films, especially titanium nitride (TiN) and zirconium nitride (ZrN), have been widely used as hard coatings, decorative coatings, diffusion barriers in IC technology and heat mirrors, as a result of their attractive properties of high hardness, corrosion resistance, thermal stability and electrical resistivity [1-4]. However, the ZrN films have shown significant performance regarding to its higher hardness, better corrosion resistance, lower electrical resistivity and warmer golden colour compared to those of the TiN films. ZrN films have shown significant performance advantages over TiN films [5-.

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Study on the erosion of Mo/ZrO2 alloys in glass melting process

High Temperature Materials and Processes ◽

10.1515/htmp-2020-0061 ◽

2020 ◽

Vol 39 (1) ◽

pp. 595-598

Author(s):

Cui Chaopeng ◽

Zhu Xiangwei ◽

Li Qiang ◽

Zhang Min ◽

Zhu Guangping

Keyword(s):

Grain Size ◽

Corrosion Resistance ◽

Powder Metallurgy ◽

Hydrothermal Synthesis ◽

Grain Boundaries ◽

Electrode Material ◽

Glass Melting ◽

Melting Process ◽

Fine Grain ◽

Conventional Electrode

AbstractThe Mo/ZrO2 electrode was prepared by combining hydrothermal synthesis with powder metallurgy, and this new electrode material has a totally different microstructure from the conventional electrode. The grain size of the new electrode was fine, and the size of ZrO2 in the alloy reached 200 nm. According to the results, the Mo–ZrO2 electrode has better performance, because the erosion occurs along the grain boundaries. Meanwhile, the new electrode, based on its fine grain, can effectively improve the corrosion resistance of the electrode.

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Dependence of Ferroelectric Properties of SBT Based Capacitors on the Electrode Material

MRS Proceedings ◽

10.1557/proc-541-185 ◽

1998 ◽

Vol 541 ◽

Author(s):

S. Tirumala ◽

S. O. Ryu ◽

K. B. Lee ◽

R. Vedula ◽

S. B. Desu

Keyword(s):

Thin Films ◽

Electrode Material ◽

Electrode Materials ◽

Perovskite Phase ◽

Ferroelectric Properties ◽

Si Substrates ◽

Non Volatile Memory ◽

Metal Organic ◽

Sputter Deposited ◽

Memory Applications

AbstractThe effect of various electrode materials on the ferroelectric properties of SrBi2Ta2O9 (SBT) thin films has been investigated for non-volatile memory applications. Two sets of electrode structures, viz., Pt-Ir based and Pt-Rh based, were sputter deposited in-situ on Si substrates. SBT thin films were deposited on these electrodes using a metal-organic solution deposition technique followed by a post-deposition anneal at 750 °C in oxygen. Structural characterization revealed a polycrystalline nature with predominant perovskite phase in SBT thin films. Ferroelectric properties were studied in capacitor mode by depositing top electrodes, where the top electrode material is identical to that of the bottom electrode. Extensive analysis of the ferroelectric properties signify the important role played by the electrode material in establishing the device applicability is reported in this work.

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