Characterization of chemical bonding features and defect state density in HfSiOx Ny/SiO2 gate stack
2007 ◽
Vol 84
(9-10)
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pp. 2386-2389
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Keyword(s):
2014 ◽
Vol 778-780
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pp. 631-634
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Keyword(s):
Keyword(s):
2004 ◽
Vol 13
(01)
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pp. 113-127
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Keyword(s):
2019 ◽
Vol 25
(22)
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pp. 5793-5802
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