scholarly journals Al2O3 coating grown on Nafion membranes by atomic layer deposition

2015 ◽  
Vol 495 ◽  
pp. 101-109 ◽  
Author(s):  
Outi Toikkanen ◽  
Mikko Nisula ◽  
Elina Pohjalainen ◽  
Sami Hietala ◽  
Hannele Havansi ◽  
...  
RSC Advances ◽  
2016 ◽  
Vol 6 (68) ◽  
pp. 63250-63255 ◽  
Author(s):  
Ming Xie ◽  
Tao Hu ◽  
Liu Yang ◽  
Yun Zhou

The electrochemical properties of high-voltage (4.7 V) LiCoO2 cathode materials with Al doping and a conformal Al2O3 coating by atomic layer deposition were studied in this paper.


2019 ◽  
Vol 7 (19) ◽  
pp. 5772-5781 ◽  
Author(s):  
Yujie Zhao ◽  
Liangjun Yin ◽  
O. M. ten Kate ◽  
Benjamin Dierre ◽  
Ruben Abellon ◽  
...  

Enhanced thermal degradation stability of the Sr2Si5N8:Eu2+ phosphor by ultra-thin Al2O3 coating through FB-ALD.


2003 ◽  
Vol 252 (4) ◽  
pp. 565-569 ◽  
Author(s):  
B. Min ◽  
J.S. Lee ◽  
J.W. Hwang ◽  
K.H. Keem ◽  
M.I. Kang ◽  
...  

Author(s):  
Д.В. Горшков ◽  
Г.Ю. Сидоров ◽  
И.В. Сабинина ◽  
Ю.Г. Сидоров ◽  
Д.В. Марин ◽  
...  

The electrophysical interface properties of the passivating Al2O3 coating grown by the method of plasma-induced atomic layer deposition at various temperatures on MBE p-CdHgTe (x = 0.22) was experimentally studied by measuring the capacitance-voltage characteristics of MIS structures. It was found that, at a temperature of Al2O3 growth of 200 °С in MCT, the concentration of acceptors increases due to dissociation. At a temperature of 80 °С, the spread in the capacitance of the dielectric and the built-in charge increases. The optimum growth temperature of the passivating Al2O3coating on CdHgTe lies in the range of 120-160 °С.


Coatings ◽  
2022 ◽  
Vol 12 (1) ◽  
pp. 84
Author(s):  
Jiawei Li ◽  
Junren Xiang ◽  
Ge Yi ◽  
Yuanting Tang ◽  
Huachen Shao ◽  
...  

Surface residual lithium compounds of Ni-rich cathodes are tremendous obstacles to electrochemical performance due to blocking ion/electron transfer and arousing surface instability. Herein, ultrathin and uniform Al2O3 coating via atomic layer deposition (ALD) coupled with the post-annealing process is reported to reduce residual lithium compounds on single-crystal LiNi0.6Mn0.2Co0.2O2 (NCM622). Surface composition characterizations indicate that LiOH is obviously reduced after Al2O3 growth on NCM622. Subsequent post-annealing treatment causes the consumption of Li2CO3 along with the diffusion of Al atoms into the surface layer of NCM622. The NCM622 modified by Al2O3 coating and post-annealing exhibits excellent cycling stability, the capacity retention of which reaches 92.2% after 300 cycles at 1 C, much higher than that of pristine NCM622 (34.8%). Reduced residual lithium compounds on NCM622 can greatly decrease the formation of LiF and the degree of Li+/Ni2+ cation mixing after discharge–charge cycling, which is the key to the improvement of cycling stability.


2020 ◽  
Vol 8 (16) ◽  
pp. 7836-7846 ◽  
Author(s):  
Huibing He ◽  
Huan Tong ◽  
Xueyang Song ◽  
Xiping Song ◽  
Jian Liu

Nanoscale Al2O3 coating by an atomic layer deposition technique enabled safe and dendrite-free Zn anodes for rechargeable aqueous zinc-ion batteries.


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