Al2O3 coating of ZnO nanorods by atomic layer deposition

2003 ◽  
Vol 252 (4) ◽  
pp. 565-569 ◽  
Author(s):  
B. Min ◽  
J.S. Lee ◽  
J.W. Hwang ◽  
K.H. Keem ◽  
M.I. Kang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Zno Nanorods ◽  
Atomic Layer ◽  
Al2o3 Coating ◽  
Layer Deposition

Synthesis of high-voltage (4.7 V) LiCoO2 cathode materials with Al doping and conformal Al2O3 coating by atomic layer deposition

RSC Advances ◽  
2016 ◽  
Vol 6 (68) ◽  
pp. 63250-63255 ◽  
Author(s):  
Ming Xie ◽  
Tao Hu ◽  
Liu Yang ◽  
Yun Zhou
Keyword(s):  
Atomic Layer Deposition ◽  
Electrochemical Properties ◽  
High Voltage ◽  
Cathode Materials ◽  
Atomic Layer ◽  
Al2o3 Coating ◽  
Al Doping ◽  
Layer Deposition ◽  
Licoo2 Cathode

The electrochemical properties of high-voltage (4.7 V) LiCoO2 cathode materials with Al doping and a conformal Al2O3 coating by atomic layer deposition were studied in this paper.

Enhanced thermal degradation stability of the Sr2Si5N8:Eu2+ phosphor by ultra-thin Al2O3 coating through the atomic layer deposition technique in a fluidized bed reactor

2019 ◽  
Vol 7 (19) ◽  
pp. 5772-5781 ◽  
Author(s):  
Yujie Zhao ◽  
Liangjun Yin ◽  
O. M. ten Kate ◽  
Benjamin Dierre ◽  
Ruben Abellon ◽  
...  
Keyword(s):  
Thermal Degradation ◽  
Atomic Layer Deposition ◽  
Fluidized Bed ◽  
Atomic Layer ◽  
Fluidized Bed Reactor ◽  
Al2o3 Coating ◽  
Deposition Technique ◽  
Layer Deposition ◽  
Atomic Layer Deposition Technique

Enhanced thermal degradation stability of the Sr2Si5N8:Eu2+ phosphor by ultra-thin Al2O3 coating through FB-ALD.

scholarly journals A promising carbon fiber-based photocatalyst with hierarchical structure for dye degradation

RSC Advances ◽  
2017 ◽  
Vol 7 (36) ◽  
pp. 22234-22242 ◽  
Author(s):  
Chen Gu ◽  
Sen Xiong ◽  
Zhaoxiang Zhong ◽  
Yong Wang ◽  
Weihong Xing
Keyword(s):  
Carbon Fiber ◽  
Atomic Layer Deposition ◽  
Magnetron Sputtering ◽  
Carbon Fibers ◽  
Dye Degradation ◽  
Zno Nanorods ◽  
Pt Nanoparticles ◽  
Atomic Layer ◽  
Dc Magnetron Sputtering ◽  
Layer Deposition

To fabricate a novel photocatalyst, ZnO seeds were uniformly deposited on carbon fibers via atomic layer deposition followed by hydrothermal growth of ZnO nanorods, then Pt nanoparticles were deposited by DC magnetron sputtering.

scholarly journals Al2O3 coating grown on Nafion membranes by atomic layer deposition

2015 ◽  
Vol 495 ◽  
pp. 101-109 ◽  
Author(s):  
Outi Toikkanen ◽  
Mikko Nisula ◽  
Elina Pohjalainen ◽  
Sami Hietala ◽  
Hannele Havansi ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Al2o3 Coating ◽  
Layer Deposition ◽  
Nafion Membranes

scholarly journals Влияние ростовой температуры на пассивирующие свойства пленок Al-=SUB=-2-=/SUB=-O-=SUB=-3-=/SUB=-, выращенных методом атомно-слоевого осаждения на поверхности CdHgTe

2020 ◽  
Vol 46 (15) ◽  
pp. 14
Author(s):  
Д.В. Горшков ◽  
Г.Ю. Сидоров ◽  
И.В. Сабинина ◽  
Ю.Г. Сидоров ◽  
Д.В. Марин ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Growth Temperature ◽  
Atomic Layer ◽  
Interface Properties ◽  
Optimum Growth ◽  
Al2o3 Coating ◽  
Optimum Growth Temperature ◽  
Layer Deposition ◽  
Capacitance Voltage ◽  
Mis Structures

The electrophysical interface properties of the passivating Al2O3 coating grown by the method of plasma-induced atomic layer deposition at various temperatures on MBE p-CdHgTe (x = 0.22) was experimentally studied by measuring the capacitance-voltage characteristics of MIS structures. It was found that, at a temperature of Al2O3 growth of 200 °С in MCT, the concentration of acceptors increases due to dissociation. At a temperature of 80 °С, the spread in the capacitance of the dielectric and the built-in charge increases. The optimum growth temperature of the passivating Al2O3coating on CdHgTe lies in the range of 120-160 °С.

Atomic layer deposition ZnO film as seed layer for hydrothermal growth of ZnO nanorods

2010 ◽  
Vol 1258 ◽  
Author(s):  
Xianglin Li ◽  
Chuanwei Cheng ◽  
Hongjin Fan
Keyword(s):  
Atomic Layer Deposition ◽  
Seed Layer ◽  
Zno Nanorods ◽  
Three Dimensional ◽  
Atomic Layer ◽  
Dip Coating ◽  
Hybrid Nanostructures ◽  
Zno Film ◽  
Layer Deposition ◽  
Coating Method

AbstractAtomic layer deposition (ALD) ZnO film as seed layer for growing aligned ZnO nanorods arrays is demonstrated. The effects of the deposition temperature and film thickness to the morphology of the ZnO nanorods are studied. The ALD is found to have its advantage over the conventional dip-coating method when being applied to three-dimensional (3D) substrates, as exemplified by the macroporous Si adn CNT arrays. As one example, the CNT-ZnO 3D hybrid nanostructures are obtained which might be useful for energy-related applications.

scholarly journals Reduction of Surface Residual Lithium Compounds for Single-Crystal LiNi0.6Mn0.2Co0.2O2 via Al2O3 Atomic Layer Deposition and Post-Annealing

Coatings ◽  
2022 ◽  
Vol 12 (1) ◽  
pp. 84
Author(s):  
Jiawei Li ◽  
Junren Xiang ◽  
Ge Yi ◽  
Yuanting Tang ◽  
Huachen Shao ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Single Crystal ◽  
Surface Composition ◽  
Annealing Treatment ◽  
Atomic Layer ◽  
Cycling Stability ◽  
Al2o3 Coating ◽  
Lithium Compounds ◽  
Post Annealing ◽  
Layer Deposition

Surface residual lithium compounds of Ni-rich cathodes are tremendous obstacles to electrochemical performance due to blocking ion/electron transfer and arousing surface instability. Herein, ultrathin and uniform Al2O3 coating via atomic layer deposition (ALD) coupled with the post-annealing process is reported to reduce residual lithium compounds on single-crystal LiNi0.6Mn0.2Co0.2O2 (NCM622). Surface composition characterizations indicate that LiOH is obviously reduced after Al2O3 growth on NCM622. Subsequent post-annealing treatment causes the consumption of Li2CO3 along with the diffusion of Al atoms into the surface layer of NCM622. The NCM622 modified by Al2O3 coating and post-annealing exhibits excellent cycling stability, the capacity retention of which reaches 92.2% after 300 cycles at 1 C, much higher than that of pristine NCM622 (34.8%). Reduced residual lithium compounds on NCM622 can greatly decrease the formation of LiF and the degree of Li+/Ni2+ cation mixing after discharge–charge cycling, which is the key to the improvement of cycling stability.

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