On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO2/Si fabricated by ECR-CVD
2005 ◽
Vol 244
(1-4)
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pp. 444-448
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1986 ◽
Vol 19
(3)
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pp. L43-L47
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1997 ◽
Vol 15
(6)
◽
pp. 1983
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2005 ◽
Vol 8
(1-3)
◽
pp. 115-120
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