Barrier property of TiSiN films formed by low frequency, high density inductively coupled plasma process
2005 ◽
Vol 198
(1-3)
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pp. 291-295
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2005 ◽
Vol 23
(6)
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pp. 2444
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2020 ◽
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2015 ◽
Vol 86
(7)
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pp. 073506
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