scholarly journals Barrier property of TiSiN films formed by low frequency, high density inductively coupled plasma process

2005 ◽  
Vol 198 (1-3) ◽  
pp. 291-295 ◽  
Author(s):  
Y.C. Ee ◽  
Z. Chen ◽  
W.D. Wang ◽  
D.Z. Chi ◽  
S. Xu ◽  
...  
2001 ◽  
Vol 8 (5) ◽  
pp. 2549-2557 ◽  
Author(s):  
S. Xu ◽  
K. N. Ostrikov ◽  
Y. Li ◽  
E. L. Tsakadze ◽  
I. R. Jones

2018 ◽  
Vol 37 (6) ◽  
pp. 545-550
Author(s):  
Mikhail Isupov ◽  
Vadim Pinaev ◽  
Daria Mul ◽  
Natalia Belousova

AbstractAn experimental investigation of plasma-assisted nitriding of austenitic stainless steel AISI 321 in a low-pressure (7 Pa), low-frequency (50–100 kHz) nitrogen inductively coupled plasma enhanced with ferromagnetic cores has been performed at the temperatures of 470–625 °C, sample biases of ‒500–‒750 V, current densities on the sample surface of 1.2–3.3 mA/cm2 and nitriding times of 20 and 60 min. It is found that even the short (20 min) ion-plasma treatment results in the formation of nitrided layers with the thickness of up to 40 μm and microhardness of up to 9 GPa.The high speed of nitriding can be explained as a result of the joint action of high ion flux density and high ion energy on the sample surface.


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