Characterization of hydrogen plasma with a fiber optics catalytic probe

2005 ◽  
Vol 475 (1-2) ◽  
pp. 12-16 ◽  
Author(s):  
U. Cvelbar ◽  
M. Mozetič ◽  
I. Poberaj ◽  
D. Babič ◽  
A. Ricard
2019 ◽  
Vol 61 (6) ◽  
pp. 065003 ◽  
Author(s):  
A Pandey ◽  
Debrup Mukherjee ◽  
Dipshikha Borah ◽  
M Bandyopadhyay ◽  
Himanshu Tyagi ◽  
...  

1990 ◽  
Vol 68 (3) ◽  
pp. 293-295 ◽  
Author(s):  
M. S. Mathur ◽  
J. S. C. McKee ◽  
G. G. Ross ◽  
H. A. Marzouk ◽  
E. B. Bradley

TiC coatings deposited by a plasma spraying process were placed on the internal wall of the tokamak fusion rector at Varennes, Quebec and were subjected to repeated ~1500 hydrogen plasma discharges. X-ray photoelectron spectroscopy and unenhanced surface Raman scattering were used to investigate the possibility of the formation of C–H and Ti–H complexes on the TiC plasma sprayed surfaces.


1990 ◽  
Vol 204 ◽  
Author(s):  
T. P. Schneider ◽  
J. Cho ◽  
J. Vander Weide ◽  
S.E. Wells ◽  
G. Lucovsky ◽  
...  

ABSTRACTThis study details low pressure and low temperature cleaning of Si(100) surfaces. The properties of Si surfaces exposed to variations in plasma generated H are described. The diagnostic techniques used to study the processing conditions are residual gas analysis (RGA) and emission spectroscopy. The surface is characterized by low energy electron diffraction (LEED) and angle resolved uv-photoemission spectroscopy (ARUPS). During the cleaning, Si complexes are formed which indicates the removal of species from the Si(100) surface. Plasma cleaning at 300°C results in a Si(100) surface with 2×1 surface diffraction patterns as detected by LEED. Measurements by ARUPS with He I radiation show the absence of Si surface states on the Hpassivated surface. The ARUPS measurements also indicate that the H begins to desorb from the Si(100) H-passivated surface at ∼500°C.


2010 ◽  
Vol 49 (8) ◽  
pp. 08JD02 ◽  
Author(s):  
Yoshinori Nakakubo ◽  
Asahiko Matsuda ◽  
Masanaga Fukasawa ◽  
Yoshinori Takao ◽  
Tetsuya Tatsumi ◽  
...  

Author(s):  
Sistla S. Shastry ◽  
Abdeq M. Abdi ◽  
A. G. Agwu Nnanna

Detection and characterization of chemical contaminants in water network is paramount for water quality and water security. The current trend of monitoring the presence of contaminants is the batch sampling technique, where sample of water is collected and analyzed in the laboratory. While this technique is accurate, it fails to provide immediate information. In this work, the authors investigate the effectiveness of utilizing a fiber optics based sensor for detecting ammonia in water. In order for the system to sense ammonia, a small portion of the cladding of the fiber optic cable is stripped and replaced by a porous polymer material. A novel procedure of etching the glass cladding is reported. The modified cladding when interacts with ammonia causes a change in intensity of the electromagnetic wave flowing through the cable. The change in intensity caused by the modified cladding is studied parametrically which will help in forming a correlation between concentration of ammonia and absorbance.


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