scholarly journals Effect of Bias Voltage on Microstructure and Properties of Tantalum Nitride Coatings Deposited by RF Magnetron Sputtering

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 911
Author(s):  
Wei Dai ◽  
Yunzhan Shi
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Rf Magnetron Sputtering ◽  
Amorphous Structure ◽  
Tribological Performance ◽  
Tantalum Nitride ◽  
Growth Morphology ◽  
Low Friction ◽  
Nitride Coatings ◽  
Overall Performance

TaNx coatings were deposited by RF magnetron sputtering with different bias voltages. The growth morphology, crystalline structure, chemical bond structure, hardness and elastic modulus, adhesion strength and tribological performance of the coatings were studied as a function of the bias voltage. The results showed that an increasing bias voltage refines the coating grains and facilitates structure densification. Simultaneously, the structure of the TaNx coatings transfers from a composite structure consisting of TaN and Ta2N crystals, through a single composite mainly composed of the Ta2N crystal, to an amorphous structure as the bias voltage increases from low to high, indicating that the phase composition of the TaNx coatings can be varied by the bias voltage. The coating composed of Ta2N crystal showed a good overall performance including enhanced hardness, enhanced adhesive strength, and good tribological performance with enhanced wear resistance and a low friction coefficient of 0.18.

Comparison of chromium nitride coatings deposited by DC and RF magnetron sputtering

2011 ◽  
Vol 519 (7) ◽  
pp. 2116-2120 ◽  
Author(s):  
Shuyong Tan ◽  
Xuhai Zhang ◽  
Xiangjun Wu ◽  
Feng Fang ◽  
Jianqing Jiang
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Chromium Nitride ◽  
Nitride Coatings

Tuning bond contents in B–C–N films via temperature and bias voltage within RF magnetron sputtering

2009 ◽  
Vol 204 (5) ◽  
pp. 713-717 ◽  
Author(s):  
Chunqiang Zhuang ◽  
Jijun Zhao ◽  
Fuchao Jia ◽  
Changyu Guan ◽  
Zhanling Wu ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Rf Magnetron Sputtering

Characterization of TiAlBN Nanocomposite Coating Deposited via Radio Frequency Magnetron Sputtering Using Single Hot-Pressed Target

2012 ◽  
Vol 626 ◽  
pp. 298-301 ◽  
Author(s):  
Zulkifli Mohd Rosli ◽  
Kwan Wai Loon ◽  
Jariah Mohd Juoi ◽  
Nayan Nafarizal ◽  
Zainab B. Mahamud ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Bias Voltage ◽  
Photoelectron Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
Deposition Process ◽  
Nanocomposite Coating ◽  
Test Method ◽  
X Ray ◽  
Excellent Adhesion

TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and-150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al)N phase was identified. In addition, the existence of BN and TiB2amorphous (a-) phase were detected by X-ray photoelectron spectroscopy (XPS) analysis. Thus, the deposited TiAlBN coatings were confirmed as nc-(Ti,Al)N/a-BN/a-TiB2nanocomposite. On the other hand, it was found that optimum bias voltage used in present study is-60 V where the deposited TiAlBN coating exhibits an excellent adhesion quality. The adhesion quality of the coatings deposited at-60V bias voltage is classified as HF 1 evaluated using the Rockwell-C adhesion test method (developed by the Union of German Engineers).

Deposition and characterization of titanium aluminum nitride coatings prepared by RF magnetron sputtering

2015 ◽  
Vol 350 ◽  
pp. 6-9 ◽  
Author(s):  
Amina Zouina Ait-Djafer ◽  
Nadia Saoula ◽  
Hamid Aknouche ◽  
Bendiba Guedouar ◽  
Noureddine Madaoui
Keyword(s):  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Titanium Aluminum ◽  
Nitride Coatings ◽  
Titanium Aluminum Nitride
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