Effects of dielectric thickness and contact area on current–voltage characteristics of thin film metal–insulator–metal diodes

2008 ◽  
Vol 516 (8) ◽  
pp. 2244-2250 ◽  
Author(s):  
Subramanian Krishnan ◽  
Elias Stefanakos ◽  
Shekhar Bhansali
Author(s):  
Никита Вадимович Пермяков

Работа посвящена разработке модульной четрырехзондовой установки с использованием жидкого контакта на основе индий-галлиевого эвтектического раствора (EGaIn), с помощью которого можно создать прижимные жидкие контакты, не вносящие механические деформации в измеряемые структуры. Предлагается использовать данную установку для измерения вольт-амперных характеристик тонкопленочных образцов. Предполагается модульная схема измерений. Каждый зонд управляется четырьмя моторами для позиционирования и выдавливания капли из шприца для формирования нужного размера пятна контакта. Используется оптический контроль для подготовки зондов и измерения диаметра сформированных контактных областей. Подобраны параметры изготовления жидких зондов, а именно скорости выдавливания и перемещения зонда вдоль вертикальной оси для формирования капли конической формы . Управление установкой осуществляется в среде LabView. The work is devoted to development of a modular four-probe setup using a liquid contact based on an indium-gallium eutectic solution (EGaIn), which can be used to create clamping liquid contacts that do not introduce mechanical deformation into the measured structures. It is proposed to use this setup for measuring the current-voltage characteristics of thin-film samples. A modular measurement scheme is assumed. Each probe is driven by four motors to position and expel a drop from the syringe to form the desired contact area size. Optical control is used to prepare the probes and measure the diameter of the formed contact areas. The parameters for the manufacture of liquid probes are selected, namely, the speed of extrusion and movement of the probe along the vertical axis to form a conical droplet. The installation is controlled in the LabView environment.


2017 ◽  
Vol 520 ◽  
pp. 112-115 ◽  
Author(s):  
Shahnaz Akbar ◽  
Khalid Mahmood ◽  
M.F. Wasiq ◽  
M.Y. Nadeem ◽  
Muhammad Azhar Khan

2014 ◽  
Vol 5 ◽  
pp. 2240-2247 ◽  
Author(s):  
Saumya Sharma ◽  
Mohamad Khawaja ◽  
Manoj K Ram ◽  
D Yogi Goswami ◽  
Elias Stefanakos

The characterization of Langmuir–Blodgett thin films of 10,12-pentacosadiynoic acid (PDA) and their use in metal–insulator–metal (MIM) devices were studied. The Langmuir monolayer behavior of the PDA film was studied at the air/water interface using surface tension–area isotherms of polymeric and monomeric PDA. Langmuir–Blodgett (LB, vertical deposition) and Langmuir–Schaefer (LS, horizontal deposition) techniques were used to deposit the PDA film on various substrates (glass, quartz, silicon, and nickel-coated film on glass). The electrochemical, electrical and optical properties of the LB and LS PDA films were studied using cyclic voltammetry, current–voltage characteristics (I–V), and UV–vis and FTIR spectroscopies. Atomic force microscopy measurements were performed in order to analyze the surface morphology and roughness of the films. A MIM tunnel diode was fabricated using a PDA monolayer assembly as the insulating barrier, which was sandwiched between two nickel layers. The precise control of the thickness of the insulating monolayers proved critical for electron tunneling to take place in the MIM structure. The current–voltage characteristics of the MIM diode revealed tunneling behavior in the fabricated Ni–PDA LB film–Ni structures.


Nanomaterials ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 1986
Author(s):  
Heng Wang ◽  
Gaurav Jayaswal ◽  
Geetanjali Deokar ◽  
John Stearns ◽  
Pedro M. F. J. Costa ◽  
...  

For THz rectennas, ultra-fast diodes are required. While the metal–insulator–metal (MIM) diode has been investigated in recent years, it suffers from large resistance and capacitance, as well as a low cut-off frequency. Alternatively, a geometric diode can be used, which is more suitable due to its planar structure. However, there is only one report of a THz geometric diode based on a monolayer graphene. It is based on exfoliated graphene, and thus, it is not suitable for mass production. In this work, we demonstrate chemical vapor deposition (CVD)-grown monolayer graphene based geometric diodes, which are mass-producible. The diode’s performance has been studied experimentally by varying the neck widths from 250–50 nm, the latter being the smallest reported neck width for a graphene geometric diode. It was observed that by decreasing the neck widths, the diode parameters such as asymmetry, nonlinearity, zero-bias resistance, and responsivity increased within the range studied. For the 50 nm neck width diode, the asymmetry ratio was 1.40 for an applied voltage ranging from −2 V to 2 V, and the zero-bias responsivity was 0.0628 A/W. The performance of the diode was also verified through particle-in-cell Monte Carlo simulations, which showed that the simulated current-voltage characteristics were consistent with our experimental results.


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