An Extended Unified Schottky-Poole-Frenkel Theory to Explain the Current-Voltage Characteristics of Thin Film Metal-Insulator-Metal Capacitors with Examples for Various High-k Dielectric Materials

W. S. Lau

doi:10.1149/2.006301jss

An Extended Unified Schottky-Poole-Frenkel Theory to Explain the Current-Voltage Characteristics of Thin Film Metal-Insulator-Metal Capacitors with Examples for Various High-k Dielectric Materials

ECS Journal of Solid State Science and Technology ◽

10.1149/2.006301jss ◽

2012 ◽

Vol 1 (6) ◽

pp. N139-N148 ◽

Cited By ~ 19

Author(s):

W. S. Lau

Keyword(s):

Thin Film ◽

Dielectric Materials ◽

Metal Insulator ◽

High K ◽

Current Voltage ◽

Metal Insulator Metal ◽

Current Voltage Characteristics ◽

High K Dielectric

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Effects of dielectric thickness and contact area on current–voltage characteristics of thin film metal–insulator–metal diodes

Thin Solid Films ◽

10.1016/j.tsf.2007.08.067 ◽

2008 ◽

Vol 516 (8) ◽

pp. 2244-2250 ◽

Cited By ~ 55

Author(s):

Subramanian Krishnan ◽

Elias Stefanakos ◽

Shekhar Bhansali

Keyword(s):

Thin Film ◽

Contact Area ◽

Metal Insulator ◽

Dielectric Thickness ◽

Current Voltage ◽

Metal Insulator Metal ◽

Current Voltage Characteristics

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An Extended Unified Schottky-Poole-Frenkel Theory to Explain the Current-Voltage Characteristics of Capacitors Using High-k Dielectric Materials

ECS Transactions ◽

10.1149/1.3700884 ◽

2012 ◽

Vol 45 (3) ◽

pp. 175-191

Author(s):

W. S. Lau

Keyword(s):

Dielectric Materials ◽

High K ◽

Current Voltage ◽

Current Voltage Characteristics ◽

High K Dielectric

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Monte Carlo simulation of current–voltage characteristics in metal–insulator–metal thin film structures

Thin Solid Films ◽

10.1016/s0040-6090(03)00387-0 ◽

2003 ◽

Vol 433 (1-2) ◽

pp. 321-325 ◽

Cited By ~ 10

Author(s):

S. Gravano ◽

E. Amr ◽

R.D. Gould ◽

M.Abu Samra

Keyword(s):

Thin Film ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Metal Insulator ◽

Metal Thin Film ◽

Current Voltage ◽

Metal Insulator Metal ◽

Current Voltage Characteristics

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Current-Voltage Characteristics and Conductivity of Metal-Insulator-Metal (Ti/TaOx/Ta) Type Thin-Film Diode

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.657 ◽

2000 ◽

Vol 39 (Part 1, No. 2A) ◽

pp. 657-661 ◽

Cited By ~ 2

Author(s):

Takanori Hirai ◽

Hiroshi Morita ◽

Masayasu Tasaka

Keyword(s):

Thin Film ◽

Metal Insulator ◽

Current Voltage ◽

Metal Insulator Metal ◽

Current Voltage Characteristics

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Atomic Layer Deposition of High-k and Nanolaminate Dielectrics for Transparent Thin Film Transistors and Metal/Insulator/Metal Tunnel Diodes

ECS Meeting Abstracts ◽

10.1149/ma2011-01/22/1369 ◽

2011 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

Atomic Layer ◽

Tunnel Diodes ◽

Metal Insulator ◽

Layer Deposition ◽

High K ◽

Metal Insulator Metal

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Metal-organic chemical vapor deposition of high-k dielectric Ce–Al–O layers from various metal-organic precursors for metal–insulator–metal capacitor applications

Thin Solid Films ◽

10.1016/j.tsf.2013.03.045 ◽

2013 ◽

Vol 536 ◽

pp. 68-73 ◽

Cited By ~ 3

Author(s):

A. Abrutis ◽

M. Lukosius ◽

M. Skapas ◽

S. Stanionyte ◽

V. Kubilius ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal ◽

Metal Organic ◽

Organic Precursors ◽

High K Dielectric ◽

Organic Chemical Vapor Deposition

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WITHDRAWN: Tailored cerium-aluminate high-k dielectric thin films for metal–insulator–metal device applications

Thin Solid Films ◽

10.1016/j.tsf.2009.12.008 ◽

2009 ◽

Author(s):

Rakesh Sohal ◽

Grzegorz Lupina ◽

Peter Zaumseil ◽

Thomas Schroeder

Keyword(s):

Thin Films ◽

Metal Insulator ◽

Dielectric Thin Films ◽

High K ◽

Metal Insulator Metal ◽

Device Applications ◽

High K Dielectric

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Effect of an ultrathin SiO2 interfacial layer on the hysteretic current–voltage characteristics of CeOx-based metal–insulator–metal structures

Thin Solid Films ◽

10.1016/j.tsf.2012.10.105 ◽

2013 ◽

Vol 533 ◽

pp. 38-42 ◽

Cited By ~ 1

Author(s):

E. Miranda ◽

S. Kano ◽

C. Dou ◽

J. Suñé ◽

K. Kakushima ◽

...

Keyword(s):

Interfacial Layer ◽

Metal Insulator ◽

Metal Structures ◽

Current Voltage ◽

Metal Insulator Metal ◽

Current Voltage Characteristics

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Current-voltage characteristics of a metal-insulator-metal (MIM) element and its new band model

10.1117/12.253346 ◽

1996 ◽

Author(s):

Hongwu Liu ◽

Jianxin Guo ◽

Jianfeng Yuan ◽

Kai Ma ◽

Xinmin Huang

Keyword(s):

Band Model ◽

Metal Insulator ◽

Current Voltage ◽

Metal Insulator Metal ◽

Current Voltage Characteristics

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Ultra-thin film and interface analysis of high-k dielectric materials employing Time-Of-Flight Medium Energy Ion Scattering (TOF-MEIS)

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2014.02.063 ◽

2014 ◽

Vol 332 ◽

pp. 212-215 ◽

Cited By ~ 6

Author(s):

D. Primetzhofer ◽

E. Dentoni Litta ◽

A. Hallén ◽

M.K. Linnarsson ◽

G. Possnert

Keyword(s):

Thin Film ◽

Time Of Flight ◽

Dielectric Materials ◽

Medium Energy ◽

Ion Scattering ◽

Interface Analysis ◽

High K ◽

Medium Energy Ion Scattering ◽

High K Dielectric ◽

Ultra Thin Film

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