Catalyst-free low-temperature growth of carbon nanofibers by microwave plasma-enhanced CVD

2009 ◽  
Vol 517 (14) ◽  
pp. 4264-4267 ◽  
Author(s):  
S. Mori ◽  
M. Suzuki
Keyword(s):  
Low Temperature ◽  
Carbon Nanofibers ◽  
Microwave Plasma ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Plasma Enhanced Cvd ◽  
Catalyst Free

Low temperature growth of catalyst-free carbon micro-trees

2014 ◽  
Vol 50 (1) ◽  
pp. 13-20 ◽  
Author(s):  
Zheqiong Fan ◽  
Ruixuan Tan ◽  
Kejian He ◽  
Mingyu Zhang ◽  
Wangshu Peng ◽  
...  
Keyword(s):  
Low Temperature ◽  
Free Carbon ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Catalyst Free

Catalyst-free, low-temperature growth of high-surface area carbon nanoflakes on carbon cloth

2009 ◽  
Vol 255 (6) ◽  
pp. 3676-3681 ◽  
Author(s):  
Tsung-Chi Hung ◽  
Chia-Fu Chen ◽  
Chien-Chung Chen ◽  
Wha-Tzong Whang
Keyword(s):  
Low Temperature ◽  
Surface Area ◽  
High Surface ◽  
High Surface Area ◽  
Carbon Cloth ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Catalyst Free ◽  
Carbon Nanoflakes

The Role of Atomic Hydrogen and Oxygen in Low Temperature Growth of Diamond by Microwave Plasma Assisted Cvd

1992 ◽  
Vol 270 ◽  
Author(s):  
Y. Muranaka ◽  
H. Yamashita ◽  
H. Miyadera
Keyword(s):  
Low Temperature ◽  
Atomic Hydrogen ◽  
Microwave Plasma ◽  
Natural Diamond ◽  
Diamond Films ◽  
Microwave Plasmas ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Good Crystallinity

ABSTRACTDiamond films grown in the microwave plasmas of CO(7–8%)-O2(0–2.2%)-H2 systems in the range of 130–750°C were characterized by scanning electron microscopy, Raman spectroscopy, and cathodoluminescence (CL) studies. The films grown in the CO-O2-H2 system had much better crystallinity than those grown in the CO-H2 system. This was because oxygen extremely purified diamond films by suppressing polyacetylene inclusion, and prohibited the vacancy formation in the crystallites. These oxygen functions have indicated the possibility that high quality diamond films (FWI-tM of the diamond Raman peak =4.0–4. lcm−1) close to natural diamond (FWHM=3.0cm−1) were obtained in the CO(8%)-O2(2.2%)-H2 system between 400 and 750°C. Though crystallinity deterioration occurred at 130°C, the obtained film (FWHM=10.2cm−1) in the CO(8%)-O2(2.2%)-H 2 system was of good crystallinity comparable to those (FWHM=7–21cm−1) grown by conventional CVD processes and gas systems between 590 and 1327°C. The CO-O2-H2 microwave plasma was concluded to be one of the best environment for the low temperature growth of highly purified diamond films of good crystallinity.

scholarly journals Low-temperature growth of nitrogen-doped carbon nanofibers by acetonitrile catalytic CVD using Ni-based catalysts

2016 ◽  
Vol 6 (8) ◽  
pp. 1211-1218 ◽  
Author(s):  
Tomohiro Iwasaki ◽  
Yuri Makino ◽  
Makoto Fukukawa ◽  
Hideya Nakamura ◽  
Satoru Watano
Keyword(s):  
Low Temperature ◽  
Carbon Nanofibers ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Nitrogen Doped ◽  
Nitrogen Doped Carbon ◽  
Catalytic Cvd

Low-Temperature Growth of Polycrystalline AlN Films by Microwave Plasma CVD

1990 ◽  
Vol 29 (Part 2, No. 2) ◽  
pp. L358-L360 ◽  
Author(s):  
Yoshihiro Someno ◽  
Makoto Sasaki ◽  
Toshio Hirai
Keyword(s):  
Low Temperature ◽  
Microwave Plasma ◽  
Plasma Cvd ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Microwave Plasma Cvd

scholarly journals Low Temperature Growth of Carbon Nanomaterials on the Polymer Substrate Using Ion Assisted Microwave Plasma CVD

2012 ◽  
Vol 25 (4) ◽  
pp. 545-549 ◽  
Author(s):  
Raman Bekarevich ◽  
Shota Miura ◽  
Akihisa Ogino ◽  
Aleksandr V. Rogachev ◽  
Masaaki Nagatsu
Keyword(s):  
Low Temperature ◽  
Carbon Nanomaterials ◽  
Microwave Plasma ◽  
Polymer Substrate ◽  
Plasma Cvd ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Microwave Plasma Cvd

scholarly journals Low temperature growth technique for nanocrystalline cuprous oxide thin films using microwave plasma oxidation of copper

2012 ◽  
Vol 71 ◽  
pp. 160-163 ◽  
Author(s):  
K.V. Rajani ◽  
S. Daniels ◽  
E. McGlynn ◽  
R. P Gandhiraman ◽  
R. Groarke ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Cuprous Oxide ◽  
Microwave Plasma ◽  
Plasma Oxidation ◽  
Oxide Thin Films ◽  
Growth Technique ◽  
Temperature Growth ◽  
Low Temperature Growth

Nanoparticles-enabled low temperature growth of carbon nanofibers and their properties for supercapacitors

2018 ◽  
Vol 9 (6) ◽  
pp. 444-449 ◽  
Author(s):  
Rickard Andersson ◽  
Amin M. Saleem ◽  
Ioanna Savva ◽  
Theodora Krasia-Christoforou ◽  
Peter Enoksson ◽  
...  
Keyword(s):  
Low Temperature ◽  
Carbon Nanofibers ◽  
Temperature Growth ◽  
Low Temperature Growth
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