Study of resistive random access memory based on TiN/TaOx/TiN integrated into a 65nm advanced complementary metal oxide semiconductor technology

2013 ◽  
Vol 533 ◽  
pp. 24-28 ◽  
Author(s):  
Therese Diokh ◽  
Elise Le-Roux ◽  
Simon Jeannot ◽  
Carlo Cagli ◽  
Vincent Jousseaume ◽  
...  
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