Bit Distribution and Reliability of High Density 1.5 V Ferroelectric Random Access Memory Embedded with 130 nm, 5 lm Copper Complementary Metal Oxide Semiconductor Logic
2006 ◽
Vol 45
(4B)
◽
pp. 3202-3206
◽
2006 ◽
Vol 45
(6B)
◽
pp. 5396-5403
◽
2012 ◽
Vol 51
(4S)
◽
pp. 04DD08
◽
2000 ◽
Vol 39
(Part 1, No. 4B)
◽
pp. 1969-1973
◽
2012 ◽
Vol 51
◽
pp. 04DD08
◽
2010 ◽
Vol 49
(4)
◽
pp. 040209
◽