Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor

2018 ◽  
Vol 660 ◽  
pp. 572-577 ◽  
Author(s):  
Donghyuk Shin ◽  
Heungseop Song ◽  
Minhyeong Lee ◽  
Heungsoo Park ◽  
Dae-Hong Ko
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Silicon Dioxide Films ◽  
Layer Deposition

Growing low-temperature, high-quality silicon-dioxide films by neutral-beam enhanced atomic-layer deposition

2019 ◽  
Vol 53 (1) ◽  
pp. 015204
Author(s):  
Hua-Hsuan Chen ◽  
Susumu Toko ◽  
Daisuke Ohori ◽  
Takuya Ozaki ◽  
Mitsuya Utsuno ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Neutral Beam ◽  
High Quality ◽  
Silicon Dioxide Films ◽  
Layer Deposition

scholarly journals Low temperature silicon dioxide by thermal atomic layer deposition: Investigation of material properties

2010 ◽  
Vol 107 (6) ◽  
pp. 064314 ◽  
Author(s):  
D. Hiller ◽  
R. Zierold ◽  
J. Bachmann ◽  
M. Alexe ◽  
Y. Yang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Material Properties ◽  
Atomic Layer ◽  
Layer Deposition

Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide

2018 ◽  
Vol 649 ◽  
pp. 24-29 ◽  
Author(s):  
Michael T. Barako ◽  
Timothy S. English ◽  
Shilpi Roy-Panzer ◽  
Thomas W. Kenny ◽  
Kenneth E. Goodson
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Dielectric Barrier ◽  
Barrier Layers ◽  
Layer Deposition
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