Titanium oxide thin films stoichiometric composition dependence on the oxygen flow at magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2021.138991 ◽

2021 ◽

pp. 138991

Author(s):

Sergey V. Bulyarskiy ◽

Daria A. Koiva ◽

Vladislav S. Belov ◽

Elena V. Zenova ◽

Grigory А. Rudakov ◽

...

Keyword(s):

Magnetron Sputtering ◽

Titanium Oxide ◽

Composition Dependence ◽

Stoichiometric Composition ◽

Oxygen Flow ◽

Oxide Thin Films

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Effects of oxygen flow ratios and annealing temperatures on Raman and photoluminescence of titanium oxide thin films deposited by reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.09.076 ◽

2009 ◽

Vol 518 (5) ◽

pp. 1415-1418 ◽

Author(s):

C.K. Chung ◽

M.W. Liao ◽

C.W. Lai

Keyword(s):

Magnetron Sputtering ◽

Titanium Oxide ◽

Reactive Magnetron Sputtering ◽

Oxygen Flow ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Annealing Temperatures

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Behaviors of carrier concentrations and mobilities in indium–tin oxide thin films by DC magnetron sputtering at various oxygen flow rates

Vacuum ◽

10.1016/j.vacuum.2004.08.006 ◽

2004 ◽

Vol 77 (1) ◽

pp. 69-77 ◽

Author(s):

Ho-Chul Lee ◽

O. Ok Park

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxygen Flow ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

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Titanium oxide thin films synthesis by pulsed – DC magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2009.01.033 ◽

2009 ◽

Vol 83 ◽

pp. S91-S94 ◽

Author(s):

Jurgita Čyvienė ◽

Edvinas Navickas ◽

Darius Milčius ◽

Giedrius Laukaitis

Keyword(s):

Magnetron Sputtering ◽

Titanium Oxide ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

Pulsed Dc ◽

Pulsed Dc Magnetron Sputtering

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Impact of the Oxygen Flow during the Magnetron Sputtering Deposition on the Indium Tin Oxide thin films for Silicon Heterojunction Solar Cell

2019 IEEE 46th Photovoltaic Specialists Conference (PVSC) ◽

10.1109/pvsc40753.2019.8980906 ◽

2019 ◽

Author(s):

Brahim Aissa ◽

Christophe Ballif ◽

Yahya Zakaria ◽

Amir A. Abdallah ◽

Maulid M. Kivambe ◽

...

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Heterojunction Solar Cell ◽

Oxygen Flow ◽

Oxide Thin Films ◽

Sputtering Deposition ◽

Silicon Heterojunction Solar Cell

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Physical Properties of Titanium Oxide Thin Films Prepared by DC Magnetron Sputtering: Influence Substrate Temperature and O2/Ar in the Gas Mixture

Journal of Fusion Energy ◽

10.1007/s10894-013-9626-9 ◽

2013 ◽

Vol 32 (6) ◽

pp. 622-626 ◽

Author(s):

M. R. Hantehzadeh ◽

M. Amou Amouha ◽

S. Solaymani ◽

T. Osati ◽

B. Ghobadi

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Physical Properties ◽

Titanium Oxide ◽

Gas Mixture ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films

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Influence of oxygen flow rate and substrate positions on properties of Cu-oxide thin films fabricated by radio frequency magnetron sputtering using pure Cu target

Thin Solid Films ◽

10.1016/j.tsf.2019.02.026 ◽

2019 ◽

Vol 675 ◽

pp. 59-65 ◽

Author(s):

Md Abdul Majed Patwary ◽

Katsuhiko Saito ◽

Qixin Guo ◽

Tooru Tanaka

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Flow Rate ◽

Oxygen Flow Rate ◽

Radio Frequency Magnetron ◽

Oxygen Flow ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

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The influence of substrate temperature on the electrical and optical properties of titanium oxide thin films prepared by d.c. reactive magnetron sputtering

10.1117/12.865917 ◽

2010 ◽

Author(s):

Yongfeng Ju ◽

Zhiming Wu ◽

Yonglong Qiu ◽

Lin Li ◽

Yadong Jiang

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Substrate Temperature ◽

Titanium Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Electrical And Optical Properties ◽

Influence Of Substrate

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Formation of titanium oxide thin films by reactive magnetron sputtering

Doklady BGUIR ◽

10.35596/1729-7648-2019-123-5-87-93 ◽

2019 ◽

pp. 87-93

Author(s):

N. Villa ◽

D. A. Golosov ◽

T. D. Nguyen

Keyword(s):

Magnetron Sputtering ◽

Titanium Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films

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Effects of Oxygen Flow Ratio and Thermal Annealing on Defect Evolution of Aluminum Doped Zinc Oxide Thin Films by Reactive DC Magnetron Sputtering

Journal of Physics Condensed Matter ◽

10.1088/1361-648x/ac1f50 ◽

2021 ◽

Author(s):

Chao Ping Liu ◽

Zhan Hua Li ◽

Kingsley Egbo ◽

Cheuk Kai Kwok ◽

Xiao Hu Lv ◽

...

Keyword(s):

Magnetron Sputtering ◽

Thermal Annealing ◽

Oxygen Flow ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

Defect Evolution ◽

Aluminum Doped Zinc Oxide

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On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping

Applied Physics A ◽

10.1007/s00339-014-8351-1 ◽

2014 ◽

Vol 116 (4) ◽

pp. 1905-1913 ◽

Author(s):

Ramanathaswamy Pandian ◽

Gomathi Natarajan ◽

S. Rajagopalan ◽

M. Kamruddin ◽

A. K. Tyagi

Keyword(s):

Magnetron Sputtering ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Titanium Oxide ◽

Phase Formation ◽

Nitrogen Doping ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films

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