In situ electrical and mechanical study of Indium Tin Oxide films deposited on polyimide substrate by Xe ion beam sputtering

2022 ◽  
Vol 741 ◽  
pp. 139035
Author(s):  
T. Chommaux ◽  
P.O. Renault ◽  
D. Thiaudière ◽  
P. Godard ◽  
F. Paumier ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Beam Sputtering ◽  
Polyimide Substrate ◽  
Mechanical Study ◽  
Beam Sputtering ◽  
Tin Oxide Films

Ultraflat indium tin oxide films prepared by ion beam sputtering

2005 ◽  
Vol 473 (2) ◽  
pp. 218-223 ◽  
Author(s):  
Younggun Han ◽  
Donghwan Kim ◽  
Jun-Sik Cho ◽  
Seok-Keun Koh
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Tin Oxide Films

Effects of ion beam voltage on properties of indium tin oxide films prepared by ion beam sputtering

2007 ◽  
Vol 23 (4) ◽  
pp. 295-299 ◽  
Author(s):  
D.-F. Lii ◽  
J.-L. Huang ◽  
I.-J. Jen ◽  
S.-S. Lin
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Beam Sputtering ◽  
Beam Voltage ◽  
Beam Sputtering ◽  
Tin Oxide Films

Effects of annealing on the properties of indium–tin oxide films prepared by ion beam sputtering

2005 ◽  
Vol 192 (1) ◽  
pp. 106-111 ◽  
Author(s):  
Ding-Fwu Lii ◽  
Jow-Lay Huang ◽  
Iau-Jiue Jen ◽  
Su-Shia Lin ◽  
Pavol Sajgalik
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Tin Oxide Films

Synthesis of tin oxide films by dual ion beam sputtering using Sn target and oxygen ion beam

1999 ◽  
Vol 112 (1-3) ◽  
pp. 267-270 ◽  
Author(s):  
Yong-Sahm Choe ◽  
Jae-Ho Chung ◽  
Dae-Seung Kim ◽  
Hong Koo Baik
Keyword(s):  
Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Ion Beam Sputtering ◽  
Oxygen Ion ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Tin Oxide Films

Indium Tin Oxide Films Formation by Laser Ablation

1993 ◽  
Vol 334 ◽  
Author(s):  
J.P. Zheng ◽  
H.S. Kwok
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Optical Transmission ◽  
Oxide Films ◽  
Three Dimensional ◽  
Initial Growth ◽  
Electrical And Optical Properties ◽  
Optimized Conditions ◽  
Tin Oxide Films

AbstractThe electrical and optical properties of room temperature laser deposited indium tin oxide films were studied. It was found that the resistivity of the film was quite sensitive to the deposition conditions. At the optimized conditions, films with a bulk resistivity value of 2.8×10−4 Ω-cm and optical transmission of greater than 90% could be obtained. By using an in situ resistance measurement, it was shown that the initial growth mode was via island formation. Additionally, a classic transition from two- to three-dimensional behavior for the resistance was observed.

Preparation and characterization of indium tin oxide films formed by oxygen ion beam assisted deposition

2003 ◽  
Vol 126 (9) ◽  
pp. 509-513 ◽  
Author(s):  
C. Liu ◽  
T. Mihara ◽  
T. Matsutani ◽  
T. Asanuma ◽  
M. Kiuchi
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Ion Beam ◽  
Oxide Films ◽  
Oxygen Ion ◽  
Ion Beam Assisted Deposition ◽  
Tin Oxide Films
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