Influence of substrate temperature on the morphology and structure of bismuth thin films deposited by magnetron sputtering

Vacuum ◽  
2019 ◽  
Vol 166 ◽  
pp. 316-322 ◽  
Author(s):  
Xiufang Qin ◽  
Caiyun Sui ◽  
Lanxin Di
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Morphology And Structure ◽  
Influence Of Substrate

Influence of Substrate Temperature on the Al and Zr Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering

2015 ◽  
Vol 814 ◽  
pp. 601-606 ◽  
Author(s):  
Fei Huan ◽  
Jin Feng Leng ◽  
Zhi Chao Meng ◽  
Bin Sun ◽  
Wen Shuang He
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Rf Magnetron Sputtering ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Free Electrons ◽  
X Ray ◽  
Influence Of Substrate ◽  
Co Doped

ZnO doped Al2O3and ZrO2(ZAZO) thin films were deposited by the radio frequency magnetron sputtering on substrate temperature with 100°C, 150°C, 200°C, 250°C and 300°C. The surface morphology and electrical properties of the films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and four-probe tester. The results showed that the substrate temperature obviously influenced the grain size of ZAZO films. The ZnO thin film had the largest crystallization orientation for the (002) peak and the smallest FWHM value at substrate temperature of 250°C. As the temperature increasing, the resistance of films gradually decreased till reaching a minimum at 250°C and then rised. Due to the increasing of Al and Zr concentrations into ZnO lattice, the Al ions created an abundance number of free electrons in the ZnO lattice, and in turn, the electrical conductivity increased. In addition, the improvement of film in the crystalline state results in the film resistivity decreases.

Influence of Substrate Temperature on the Characteristics of Zinc Oxide Thin Films Deposited by Magnetron Sputtering

2012 ◽  
Vol 502 ◽  
pp. 111-115
Author(s):  
J.H. Gu ◽  
Z.Y. Zhong ◽  
X. He ◽  
J. Hou ◽  
C.Y. Yang
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Visible Spectrum ◽  
Optical Characteristics ◽  
Zno Thin Films ◽  
Zno Films ◽  
Sintered Ceramic ◽  
Influence Of Substrate

Zinc oxide (ZnO) thin films were deposited by RF magnetron sputtering on glass substrates employing a sintered ceramic target and pure argon gas. The influence of substrate temperature on microstructure and optical characteristics of the deposited films were investigated by X-ray diffractometer (XRD) and spectrophotometer. The results demonstrate that all the ZnO films have preferred orientation along (002) direction. The substrate temperature significantly affects the crystalline quality and optical characteristics of the ZnO thin films. With the increase of substrate temperature, the mean grain size, lattice spacing and optical bandgap of the films increase, the dislocation density and micro strain decrease, and the average transmitance in the wavelength range of the visible spectrum also increases.

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