The nucleation and growth of graphene under a controlled atmosphere during radio frequency-plasma-enhanced chemical vapor deposition

Vacuum ◽  
2021 ◽  
pp. 110750
Author(s):  
Na Li ◽  
Zhen Zhen ◽  
Rujing Zhang ◽  
Rende Mu ◽  
Zhenhua Xu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nucleation And Growth ◽  
Radio Frequency Plasma ◽  
Controlled Atmosphere ◽  
Frequency Plasma

scholarly journals Nucleation and growth dynamics of graphene grown by radio frequency plasma-enhanced chemical vapor deposition

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Na Li ◽  
Zhen Zhen ◽  
Rujing Zhang ◽  
Zhenhua Xu ◽  
Zhen Zheng ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Grain Growth ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nucleation And Growth ◽  
Rf Plasma ◽  
Radio Frequency Plasma ◽  
Frequency Plasma ◽  
Different Temperatures

AbstractWe investigated the nucleation and grain growth of graphene grown on Cu through radio frequency plasma-enhanced chemical vapor deposition (RF-PECVD) at different temperatures. A reasonable shielding method for the placement of copper was employed to achieve graphene by RF-PECVD. The nucleation and growth of graphene grains during PECVD were strongly temperature dependent. A high growth temperature facilitated the growth of polycrystalline graphene grains with a large size (~ 2 μm), whereas low temperature induced the formation of nanocrystalline grains. At a moderate temperature (790 to 850 °C), both nanocrystalline and micron-scale polycrystalline graphene grew simultaneously on Cu within 60 s with 50 W RF plasma power. As the growth time increased, the large graphene grains preferentially nucleated and grew rapidly, followed by the nucleation and growth of nanograins. There was competition between the growth of the two grain sizes. In addition, a model of graphene nucleation and grain growth during PECVD at different temperatures was established.

Synthesis of carbon nanosheets by inductively coupled radio-frequency plasma enhanced chemical vapor deposition

Carbon ◽  
2004 ◽  
Vol 42 (14) ◽  
pp. 2867-2872 ◽  
Author(s):  
Jianjun Wang ◽  
Mingyao Zhu ◽  
Ron A. Outlaw ◽  
Xin Zhao ◽  
Dennis M. Manos ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Radio Frequency Plasma ◽  
Carbon Nanosheets ◽  
Inductively Coupled ◽  
Frequency Plasma

scholarly journals GROWING CARBON BUCKONIONS BY RADIO FREQUENCY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

2001 ◽  
Vol 50 (7) ◽  
pp. 1264
Author(s):  
CHEN XIAO-HUA ◽  
WU GUO-TAO ◽  
DENG FU-MING ◽  
WANG JIAN-XIONG ◽  
YANG HANG-SHENG ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Radio Frequency ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Radio Frequency Plasma ◽  
Frequency Plasma
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