Epitaxial growth of TiO2 films in a hydroxyl-free atomic layer deposition process

2002 ◽  
Vol 235 (1-4) ◽  
pp. 293-299 ◽  
Author(s):  
Mikael Schuisky ◽  
Kaupo Kukli ◽  
Jaan Aarik ◽  
Jun Lu ◽  
Anders Hårsta
Keyword(s):  
Atomic Layer Deposition ◽  
Epitaxial Growth ◽  
Atomic Layer ◽  
Deposition Process ◽  
Tio2 Films ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Highly conductive and stable Co9S8 thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth

2021 ◽  
Author(s):  
Miika Mattinen ◽  
Timo Hatanpää ◽  
Kenichiro Mizohata ◽  
Jyrki Räisänen ◽  
Markku Leskela ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Epitaxial Growth ◽  
Process Development ◽  
Atomic Layer ◽  
Deposition Process ◽  
Metallic Conductivity ◽  
Atomic Layer Deposition Process ◽  
Energy Applications ◽  
Layer Deposition

Co9S8 is an interesting sulfide material with metallic conductivity that has shown promise for various energy applications. Herein, we report a new atomic layer deposition process producing crystalline, pure, and...

scholarly journals In Situ SiO2 Passivation of Epitaxial (100) and (110)InGaAs by Exploiting TaSiOx Atomic Layer Deposition Process

ACS Omega ◽  
2018 ◽  
Vol 3 (11) ◽  
pp. 14567-14574 ◽  
Author(s):  
Mantu K. Hudait ◽  
Michael B. Clavel ◽  
Jheng-Sin Liu ◽  
Shuvodip Bhattacharya
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Al 2 O 3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

2019 ◽  
Vol 217 (8) ◽  
pp. 1900237
Author(s):  
Zhen Zhu ◽  
Saoussen Merdes ◽  
Oili M. E. Ylivaara ◽  
Kenichiro Mizohata ◽  
Mikko J. Heikkilä ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Thermal Plasma ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Optical in situ monitoring of plasma-enhanced atomic layer deposition process

2018 ◽  
Vol 57 (6S2) ◽  
pp. 06JF05 ◽  
Author(s):  
Muhammad Zeeshan Arshad ◽  
Kyung Jae Jo ◽  
Hyun Gi Kim ◽  
Sang Jeen Hong
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
In Situ Monitoring ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition
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