scholarly journals Highly conductive and stable Co9S8 thin films by atomic layer deposition: from process development and film characterization to selective and epitaxial growth

2021 ◽  
Author(s):  
Miika Mattinen ◽  
Timo Hatanpää ◽  
Kenichiro Mizohata ◽  
Jyrki Räisänen ◽  
Markku Leskela ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Epitaxial Growth ◽  
Process Development ◽  
Atomic Layer ◽  
Deposition Process ◽  
Metallic Conductivity ◽  
Atomic Layer Deposition Process ◽  
Energy Applications ◽  
Layer Deposition

Co9S8 is an interesting sulfide material with metallic conductivity that has shown promise for various energy applications. Herein, we report a new atomic layer deposition process producing crystalline, pure, and...

Al 2 O 3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

2019 ◽  
Vol 217 (8) ◽  
pp. 1900237
Author(s):  
Zhen Zhu ◽  
Saoussen Merdes ◽  
Oili M. E. Ylivaara ◽  
Kenichiro Mizohata ◽  
Mikko J. Heikkilä ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Thermal Plasma ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Epitaxial growth of TiO2 films in a hydroxyl-free atomic layer deposition process

2002 ◽  
Vol 235 (1-4) ◽  
pp. 293-299 ◽  
Author(s):  
Mikael Schuisky ◽  
Kaupo Kukli ◽  
Jaan Aarik ◽  
Jun Lu ◽  
Anders Hårsta
Keyword(s):  
Atomic Layer Deposition ◽  
Epitaxial Growth ◽  
Atomic Layer ◽  
Deposition Process ◽  
Tio2 Films ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals MoS2 thin films from a (NtBu)2(NMe2)2Mo and 1-propanethiol atomic layer deposition process

2019 ◽  
Vol 37 (1) ◽  
pp. 010901 ◽  
Author(s):  
Berc Kalanyan ◽  
Ryan Beams ◽  
Michael B. Katz ◽  
Albert V. Davydov ◽  
James E. Maslar ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Toolbox for atomic layer deposition process development on high surface area powders

2021 ◽  
Vol 92 (2) ◽  
pp. 025115
Author(s):  
K. Knemeyer ◽  
R. Baumgarten ◽  
P. Ingale ◽  
R. Naumann d’Alnoncourt ◽  
M. Driess ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Surface Area ◽  
Process Development ◽  
High Surface ◽  
High Surface Area ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Atomic layer deposition process with TiF_4 as a precursor for depositing metal fluoride thin films

2008 ◽  
Vol 47 (13) ◽  
pp. C271 ◽  
Author(s):  
Tero Pilvi ◽  
Mikko Ritala ◽  
Markku Leskelä ◽  
Martin Bischoff ◽  
Ute Kaiser ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Metal Fluoride ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals Si surface passivation by Al2O3 thin films deposited using a low thermal budget atomic layer deposition process

2013 ◽  
Vol 102 (13) ◽  
pp. 131603 ◽  
Author(s):  
G. Seguini ◽  
E. Cianci ◽  
C. Wiemer ◽  
D. Saynova ◽  
J. A. M. van Roosmalen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Deposition Process ◽  
Thermal Budget ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition ◽  
Low Thermal Budget
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