Effects of deposition parameters on microstructure and thermal conductivity of diamond films deposited by DC arc plasma jet chemical vapor deposition

2009 ◽  
Vol 19 (1) ◽  
pp. 131-137 ◽  
Author(s):  
Quan-yan QU ◽  
Wan-qi QIU ◽  
De-chang ZENG ◽  
Zhong-wu LIU ◽  
Ming-jiang DAI ◽  
...  
Keyword(s):  
Thermal Conductivity ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Plasma Jet ◽  
Arc Plasma ◽  
Deposition Parameters ◽  
Dc Arc

Homoepitaxial Diamond Synthesis by DC Arc Plasma Jet Chemical Vapor Deposition

1996 ◽  
Vol 35 (Part 2, No. 5A) ◽  
pp. L577-L580 ◽  
Author(s):  
Akira Higa ◽  
Akimitsu Hatta ◽  
Toshimichi Ito ◽  
Takehiro Maehama ◽  
Minoru Toguchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Jet ◽  
Diamond Synthesis ◽  
Arc Plasma ◽  
Dc Arc

Size Dependence of Morphology of Diamond Surfaces Prepared by DC Arc Plasma Jet Chemical Vapor Deposition

1992 ◽  
Vol 31 (Part 1, No. 2A) ◽  
pp. 355-360 ◽  
Author(s):  
Keiji Hirabayashi ◽  
Noriko Iwasaki Kurihara ◽  
Naoto Ohtake ◽  
Masanori Yoshikawa
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Size Dependence ◽  
Chemical Vapor ◽  
Plasma Jet ◽  
Arc Plasma ◽  
Diamond Surfaces ◽  
Dc Arc

Diamond growth by hollow cathode arc plasma chemical vapor deposition

1998 ◽  
Vol 13 (11) ◽  
pp. 3114-3121 ◽  
Author(s):  
Gou-Tsau Liang ◽  
Franklin Chau-Nan Hong
Keyword(s):  
Chemical Vapor Deposition ◽  
Substrate Temperature ◽  
Hollow Cathode ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Arc Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Cathode Arc

Hollow cathode arc plasma chemical vapor deposition was employed to grow crystalline diamond films using 1.5% to 7% of methane in hydrogen. The growth rate was as high as 3.2 μ/h when using 5% CH4/H2 at a pressure of 15 Torr and a substrate temperature of 1083 K. However, an intermediate layer of several hundred nanometers was observed at the film-substrate interface by cross-section SEM. Raman and XPS characterizations showed that the interfacial layer consisted of sp2 carbon and TaC with Ta vaporized from the hot cathode tube. XRD and XPS results further showed that the deposited diamond films also contained TaC. Ta composition in the film increased with the increase of growth pressure, the reduction of substrate temperature, and the increase of H2 flow in the Ta tube. The diamond films deposited by using CHCl3 as carbon source had Ta concentrations one order of magnitude higher than those using CH4, as shown by XPS results, but the nucleation densities using CHCl3 were always higher than those using CH4.

High-rate chemical vapor deposition of diamond films by dc arc discharge in hydrogen-methane mixture gas

1990 ◽  
Author(s):  
Xiang-Liu Jiang ◽  
Fang-Qing Zhang ◽  
Jiang-Qi Li ◽  
Bin Yang ◽  
Guang-Hua Chen
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Arc Discharge ◽  
Diamond Films ◽  
Chemical Vapor ◽  
High Rate ◽  
Methane Mixture ◽  
Dc Arc
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