The possibility for a voltage measurement technique using paraelectric behavior of capacitively coupled plasmas
Keyword(s):
AbstractAn argon plasma is created from a general capacitively coupled plasma source and monitored by optical emission spectroscopy. A relation between the line intensity and the applied voltage is obtained and discussed. The plasma shows paraelectric behavior. A linear relation exists between the electric capacity of the capacitively coupled plasma and the applied voltage. This linear relation can be used in a new voltage measurement technique in which the applied voltage can be calculated from the measured line intensity.
2011 ◽
Vol 13
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pp. 61-67
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2005 ◽
Vol 38
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pp. 287-299
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2010 ◽
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pp. 53-58
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2007 ◽
Vol 25
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pp. 455-463
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2005 ◽
Vol 33
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pp. 382-383
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2008 ◽
Vol 25
(8)
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pp. 2942-2945
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