Microstructure Of Au/Ti Ohmic Contacts On n-GaN

1998 ◽  
Vol 4 (S2) ◽  
pp. 668-669
Author(s):  
R.-J. Liu ◽  
L. L. Smith ◽  
M. J. Kim ◽  
R. W. Carpenter ◽  
R. F. Davis

GaN is a semiconductor with a direct band-gap of 3.4 eV which has a potential application in optoelectronic devices such as UV-emitting lasers and blue light emitting diodes. Extensive efforts have been made to develop low-resistance, thermally stable and uniform ohmic contacts on GaN. In this study, n-GaN films (Si-doped) with an intermediate A1N buffer layer were grown on 6H-SiC substrates via MOVPE. The contacts were formed by depositing Ti and then Au films on GaN by e-beam evaporation at room temperature. Current-voltage measurements as a function of temperature showed that the ohmicity of the Au/Ti contact improved upon annealing, corresponding to changes in the microstructure of the contact interfaces involving a redistribution of nitrogen and gold.Fig. 1 shows the microstructure of the as-deposited Au/Ti/GaN films. The nanocrystalline Ti film was about 50 nm thick. Au film was polycrystalline, containing many growth twins. The thickness of Au film varied from 260 to 350 nm.

2017 ◽  
Vol 56 (3) ◽  
pp. 032102 ◽  
Author(s):  
Kazuki Tani ◽  
Shin-ichi Saito ◽  
Katsuya Oda ◽  
Makoto Miura ◽  
Yuki Wakayama ◽  
...  

2015 ◽  
Vol 242 ◽  
pp. 353-360
Author(s):  
Michael Oehme ◽  
Martin Gollhofer ◽  
Konrad Kostecki ◽  
Roman Koerner ◽  
Stefan Bechler ◽  
...  

The heteroepitaxial growth of GeSn and Ge crystals on Si substrates are investigated for Si-based photonic applications. Light Emitting Diodes with emission wavelengths from 2,100 to 1,550 nm could be demonstrated with active intrinsic GeSn light emitting layers between Ge barriers. A clear shift of the direct band gap toward the infrared beyond 2 μm is measured. Emission intensity is increased compared to Ge Light Emitting Diodes. Room temperature lasing from electrically pumped n-type doped Ge edge emitting devices are demonstrated. The edge emitter is formed by cleaving Si-Ge waveguide heterodiodes, providing optical feedback through a Fabry-Pérot resonator. The electroluminescence spectra of the devices showed optical bleaching and intensity gain for wavelengths between 1,660 nm and 1,700 nm.


2015 ◽  
Vol 15 (10) ◽  
pp. 7733-7737 ◽  
Author(s):  
Kwanjae Lee ◽  
Cheul-Ro Lee ◽  
Jin Soo Kim ◽  
Jin Hong Lee ◽  
Kee Young Lim ◽  
...  

We report the influences of a Si-doped graded superlattice (SiGSL) on the electrostatic discharge (ESD) characteristics of an InGaN/GaN light-emitting diode (LED). For comparison, a conventional InGaN/GaN LED (C-LED) was also investigated. The luminous efficacy for the SiGSL-LED was 2.68 times stronger than that for the C-LED at the injection current of 20 mA. The resistances estimated from current–voltage (I–V) characteristic curves were 16.5 and 8.8 Ω for the C-LED and SiGSL-LED, respectively. After the ESD treatment at the voltages of 4000 and 6000 V, there was no significant change in the I–V curves for the SiGSL-LED. Also, there was small variation in the I–V characteristics for the SiGSL-LED at the ESD voltage of 8000 V. However, the I–V curves for the C-LED were drastically degraded with increasing ESD voltage. While the light emission was not observed at the injection current of 20 mA from the C-LED sample after the ESD treatment, the emission spectra for the SiGSL-LED sample were clearly measured with the output powers of 10.47, 9.66, and 7.27 mW for the ESD voltages of 4000, 6000, and 8000 V respectively.


2001 ◽  
Author(s):  
Jong-Lam Lee ◽  
Ho W. Jang ◽  
Jung G. Kim ◽  
Changmin Jeon

2016 ◽  
Vol 602 ◽  
pp. 43-47 ◽  
Author(s):  
Dong Wang ◽  
Takayuki Maekura ◽  
Keisuke Yamamoto ◽  
Hiroshi Nakashima

2006 ◽  
Vol 05 (06) ◽  
pp. 859-864
Author(s):  
KI-SUNG YANG ◽  
HO-SIK LEE ◽  
SEUNG-UN KIM ◽  
YOON-KI JANG ◽  
DOO-SEOK KIM ◽  
...  

Since the first report of the light-emitting diodes based on Alq 3, many organic materials have been synthesized and extended efforts have been made to obtain high performance electroluminescent (EL) device. We synthesized new emissive material, 1, 4-dihydoxy-5, 8-naphtaquinone· Alq 3 complex( Al 2 Nq 4), and extended efforts have been made to obtain high-performance electroluminescent (EL) devices. Current–voltage (I–V) and luminance–voltage (L–V) characteristics were measured by Flat Panel Display Analysis System (Model 200-AT) at room temperature. The Al 2 Nq 4 shows green photoluminescence and electroluminescence spectra at about 510 nm, and ITO/Al 2 Nq 4/Cathode device shows typical rectifying characteristics.


Author(s):  
Yen-Yu Chen ◽  
Chia-Chun Yen ◽  
Yi-Hsin Nien ◽  
Wen-Wei Hsu ◽  
Qing-Qi Chen ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document