scholarly journals Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition

2019 ◽  
Vol 31 (4) ◽  
pp. 1250-1257 ◽  
Author(s):  
Alfredo Mameli ◽  
Bora Karasulu ◽  
Marcel A. Verheijen ◽  
Beatriz Barcones ◽  
Bart Macco ◽  
...  
Keyword(s):  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Electron Beam Induced Deposition

Facile rearrangement of molecular layer deposited metalcone thin films by electron beam irradiation for area selective atomic layer deposition

2021 ◽  
Author(s):  
Seunghwan Lee ◽  
GeonHo Baek ◽  
Hye-mi Kim ◽  
Yong-Hwan Kim ◽  
Jin-Seong Park
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Electron Beam Irradiation ◽  
Molecular Layer ◽  
Atomic Layer ◽  
Beam Irradiation ◽  
Selective Deposition ◽  
Layer Deposition ◽  
Amorphous Structures

Metalcone films can be rearranged from amorphous structures to 2D-like carbon by electron beam irradiation. The irradiated indicone (HQ) film can be used as an inhibitor for selective deposition delaying 20 cycles of ALD of ZnO.

Atomic layer deposition of an Al2O3dielectric on ultrathin graphite by using electron beam irradiation

2012 ◽  
Vol 33 (9) ◽  
pp. 093004 ◽  
Author(s):  
Ran Jiang ◽  
Lingguo Meng ◽  
Xijian Zhang ◽  
Hyung-Suk Jung ◽  
Cheol Seong Hwang
Keyword(s):  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Electron Beam Irradiation ◽  
Atomic Layer ◽  
Beam Irradiation ◽  
Layer Deposition

scholarly journals Au-covered hollow urchin-like ZnO nanostructures for surface-enhanced Raman scattering sensing

2019 ◽  
Vol 7 (47) ◽  
pp. 15066-15073 ◽  
Author(s):  
Octavio Graniel ◽  
Igor Iatsunskyi ◽  
Emerson Coy ◽  
Christophe Humbert ◽  
Grégory Barbillon ◽  
...  
Keyword(s):  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Raman Scattering ◽  
Nanosphere Lithography ◽  
Atomic Layer ◽  
Zno Nanostructures ◽  
Layer Deposition ◽  
Surface Enhanced ◽  
Surface Enhanced Raman ◽  
Enhanced Raman Scattering

Au-covered hollow urchin-like ZnO nanostructures were prepared with controlled size by combining nanosphere lithography (NSL), atomic layer deposition (ALD), electrodeposition, and electron beam (e-beam) evaporation.

Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2substratum

2017 ◽  
Vol 28 (39) ◽  
pp. 395301 ◽  
Author(s):  
Marcel Junige ◽  
Markus Löffler ◽  
Marion Geidel ◽  
Matthias Albert ◽  
Johann W Bartha ◽  
...  
Keyword(s):  
Electron Beam ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition
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