Why Chemical Vapor Deposition Grown MoS2 Samples Outperform Physical Vapor Deposition Samples: Time-Domain ab Initio Analysis

Nano Letters ◽  
2018 ◽  
Vol 18 (6) ◽  
pp. 4008-4014 ◽  
Author(s):  
Linqiu Li ◽  
Run Long ◽  
Oleg V. Prezhdo
Keyword(s):  
Chemical Vapor Deposition ◽  
Ab Initio ◽  
Time Domain ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor

scholarly journals Welding, Joining, and Coating of Metallic Materials

Materials ◽  
2020 ◽  
Vol 13 (11) ◽  
pp. 2640
Author(s):  
Michael Zinigrad ◽  
Konstantin Borodianskiy
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Metallic Substrate ◽  
Metallic Materials ◽  
Special Issue ◽  
Different Types ◽  
Recent Developments ◽  
Micro Arc Oxidation

Welding, joining, and coating of metallic materials are among the most applicable fabrication processes in modern metallurgy. Welding or joining is the manufacture of a metal one-body workpiece from several pieces. Coating is the process of production of metallic substrate with required properties of the surface. A long list of specific techniques is studied during schooling and applied in industry; several include resistant spot, laser or friction welding, micro arc oxidation (MAO), chemical vapor deposition (CVD), and physical vapor deposition (PVD), among others. This Special Issue presents 21 recent developments in the field of welding, joining, and coating of various metallic materials namely, Ti and Mg alloys, different types of steel, intermetallics, and shape memory alloys.

The Application of Wear Resistant Thin Layers for Cold Forming Tools

2014 ◽  
Vol 782 ◽  
pp. 619-622 ◽  
Author(s):  
Pavol Beraxa ◽  
Lucia Domovcová ◽  
Ľudovít Parilák
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Operating Conditions ◽  
Thin Layers ◽  
Treatment Technology ◽  
Cold Forming ◽  
Forming Tools

Along with technologies development rise demands on the technical level of new machinery and equipment and also the reliability and efficiency of tools used in the production processes. One of the options for increasing tool life and wear resistance is the use of tools surface treatment technology called as CVD (chemical vapor deposition) and PVD (Physical Vapor Deposition) process. Chemical vapor deposition is a widely used materials-processing. CVD is an atomistic surface modification process, where a thin solid coating is deposited on an underlying heated substrate via a chemical reaction from the vapor or gas phase, PVD process is atomistic deposition process in which material is vaporized from a solid or liquid source in the form of atoms or molecules, transported in the form of a vapor through a vacuum or low pressure gaseous (or plasma) environment to the substrate where it condenses. The paper introduces the possibilities of application of these processes for cold forming tools used at operating conditions of Železiarne Podbrezová, a.s. Tools (formers and straightening rolls) are evaluated in terms of CVD and PVD coating thickness, microstructure and microhardness of tool material and coating.

Synthesis and Characterization of α-Alumina Films Via Combustion Chemical Vapor Deposition

2000 ◽  
Vol 616 ◽  
Author(s):  
G. Grandinetti ◽  
S. Shanmugham ◽  
M.R. Hendrick ◽  
J.M. Hampikian
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Semiconductor Device ◽  
Sol Gel ◽  
Chemical Vapor ◽  
High Hardness ◽  
Reaction Chamber ◽  
Good Oxidation Resistance ◽  
Alumina Films

Abstractα-Alumina films are useful for high-temperature, wear, and semiconductor device applications because of their good oxidation resistance, high hardness values, and electrical properties. α-Alumina films have been previously synthesized using techniques such as chemical vapor deposition, sol-gel, physical vapor deposition, and plasma spraying. This paper presents an alternative approach for producing high quality dense α-alumina coatings using a flame-assisted process called combustion chemical vapor deposition (CCVD). This process is an open atmosphere technique that does not require the use of a reaction chamber. In this work alumina films were grown on YSZ at temperatures ranging from 900 to 1500°C. At lower temperatures only amorphous alumina was grown, but as the deposition temperature increased different alumina phases were formed. At 1100°C, a thin highly crystalline θ-Al2O3 coating was formed. At temperatures higher than 1100°C thick θ-Al2O3 coatings were deposited on the YSZ. Coatings were characterized by scanning electron microscopy (SEM) and x-ray diffraction (XRD).

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